Flux flow resistivity and vortex viscosity of high-Tc films
Abstract
The flux flow regime of high-T
c
samples of different normal state resistivities is studied in the temperature range where the sign of the Hall effect is reversed. The scaling of the vortex viscosity with normal state resistivity is consistent with the Bardeen-Stephen theory. Estimates of the influence of possible mechanisms suggested for the sign reversal of the Hall effect are also given.