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Why does fused silica hold up so well in high temperature environments? What is the scientific principle behind this?
In today's era of rapid technological development, fused quartz, as an important material, plays an indispensable role in the manufacturing of electronic semiconductors, optical applications, or the production of high-energy lamps. What’s special about it is that it can be as stable as a boulder in a high-temperature environment. What scientific principles does this performance come from?
Fused silica is almost purely composed of silica. Its excellent melting point and extremely low thermal expansion coefficient make it perform very well in high temperature environments.
Fused silica (also known as fused silica) is a glass composed of almost pure silicon dioxide (SiO2), and its structure is amorphous. This is different from general commercial glass such as soda glass or lead glass, which add various materials to change its optical and physical properties, such as lowering the melting point or improving mechanical strength. The high melting point and working temperature of fused silica make it difficult to process, but it also gives it extremely strong chemical stability and excellent heat resistance, making it more valuable in high-temperature environments.
The chemical stability of fused quartz means that it rarely reacts chemically with other substances, which is especially important in high-temperature environments.
The process of making fused silica can be traced back to high-purity quartz sand, which is melted at a high temperature of 2200°C (4000°F) without the need to add other materials in the process. Its main manufacturing methods can be divided into four categories. Different methods will affect the impurity content in the final product. These impurities have a critical impact on the optical properties of fused silica. For example, certain impurities such as aluminum and titanium will limit its transmittance in the ultraviolet range. In some specific applications, the presence of moisture will need to be controlled, because moisture will cause the generation of "hydroxyl" (OH) groups. , which in turn affects the transmittance of infrared rays.
Scientific principles of high temperature resistance
The magnitude of the changes in fused quartz is directly related to the structure of the material. In its molten state, fused quartz does not have a crystal structure, which allows it to exist in an amorphous form. This amorphous environment allows the material to withstand rapid temperature changes without cracks, which is why it can persist in high temperature environments. One of the reasons.
Fused silica's extremely low coefficient of thermal expansion means it barely deforms under drastic temperature changes, making it an ideal material for high-temperature applications.
In addition, the superior optical properties of fused silica also make it widely used in the production of optical equipment and optical fibers. In terms of transmittance of ultraviolet light and near-mid-infrared light, fused silica performs much better than other commonly used glasses, giving it unique advantages in manufacturing special optical components.
Application scope of fused quartz
The superior properties of fused silica make it play an important role in many fields. In the semiconductor industry, its strength, thermal stability and extreme transparency make it an ideal substrate for photolithography masks. In addition, fused quartz has also shown its excellent performance in making windows for aerospace vehicles and transparent shells for submarines. These applications require materials that not only have high temperature resistance but also maintain transparency and stability under extreme conditions.
In the production of many high-energy lamps, the high heat resistance of fused quartz is the key to its long operation.
With the advancement of science and technology, the application of fused quartz in emerging fields is also expanding. For example, in the manufacture of microwave circuit substrates and high-precision filters, the low dielectric constant of fused silica enables higher impedance tracks or thinner substrate designs, which will undoubtedly promote the continued evolution of data storage technology.
Fused quartz is undoubtedly an indispensable material in modern industry. But as demand for material performance increases, can fused silica continue to meet the increasingly difficult industrial challenges of the future?
