Formation and gas barrier properties of silica thin films formed on heat resistant PET (Polyethylene Terephthalate) substrate by excimer light irradiation to polysilazane coatings

Abstract

Abstract A solution of polysilazane (Perhydropolysilazane) was applied to a heat resistant PET substrate, and then irradiated with excimer light at 150\u202f°C to form a gas barrier film. This film primarily consisted of a thin layer of SiO2, and had very high gas barrier properties, with a water vapor transmission rate of 0.02\u202fg/m2·day or less (40\u202f°C/90% RH). This gas barrier film has good transparency, film adhesion, surface flatness, and flexibility, and since it has high heat resistance and good gas barrier performance, it is expected to have applications in films for flexible devices.