New insights into the mechanism of photodegradation of chitosan.

Abstract

Chitosan films were subjected to accelerated artificial weathering at λ>300 nm and 60 °C in the presence of O2. The resulting variations in the chemical structure were characterized by IR spectroscopy and UV-vis spectroscopy, and a photooxidation mechanism was proposed based on the identified oxidation photoproducts. The formation of gluconolactone derivatives leading to chain scissions was shown. In addition, low molecular weight photoproducts, which accounted for chitosan deacetylation, were detected. Furthermore, crosslinking reactions occurred, as revealed by gel fraction characterization. Variations in the mechanical and surface properties were characterized by AFM, and the reduction in macroscopic properties was correlated with the structural changes observed at the molecular scale by a multiscale approach.