Electron transport in N-polar GaN-based heterostructures

Abstract

Electron transport in N-polar GaN-based high-electron-mobility transistor (HEMT) structures with a combination of In0.18Al0.82N-AlN as the barrier was studied via temperature-dependent van der Pauw Hall and Shubnikov de Haas measurements. In contrast to Ga-polar HEMT structures, no persistent photoconductivity could be detected. In a sample with 10\u2009nm thick InAlN, only one oscillation frequency was observed, demonstrating that a single sublevel is present. From the oscillations, a two-dimensional electron gas carrier density of 8.54\u2009×\u20091012\u2009cm−2 and a mobility of 4970\u2009cm2/V s were extracted at 1.7\u2009K. This sample was further investigated using ionic liquid gating. The charge density was varied from 7.5\u2009×\u20091012\u2009cm−2 to 9.6\u2009×\u20091012\u2009cm−2. The electron mobility significantly declined with decreasing charge density. This is in contrast to Ga-polar HEMT structures, where the electron mobility typically increases slightly as the charge density decreases.