Archive | 2019

The impact of heat treatment technology and parameters on TiO2 thin film forming

 
 
 
 
 
 
 
 

Abstract


Nano-size titanium dioxide TiO2 is a kind of excellent photocatalyst material, especially after thin film preparation, lots of problems which easily appear in nano-powder material are successfully avoided. However, currently the manufacturing technology of titanium dioxide thin film is still immature. In the experiments of this paper, sol-gel method and spin coating technology are adopted, n-butyl titanate, acetic acid, acetylacetone, ethanol and deionized water are used as raw material for the preparation of TiO2 thin film. Process parameters for obtaining continuous uniform TiO2 thin film are as follows: the speed of spin-coating is 3000r/min, the pretreatment temperature is 80°C, pretreatment time span is 10 minutes, the heating rate from room temperature to 200°C is 0.5°C/min and 3°C/min at high-temperature. Crystalline film with anatase structure is obtained after annealing at 500°C and the crystallite size of TiO2 thin film is between 30\u2005nm and 80\u2005nm.Nano-size titanium dioxide TiO2 is a kind of excellent photocatalyst material, especially after thin film preparation, lots of problems which easily appear in nano-powder material are successfully avoided. However, currently the manufacturing technology of titanium dioxide thin film is still immature. In the experiments of this paper, sol-gel method and spin coating technology are adopted, n-butyl titanate, acetic acid, acetylacetone, ethanol and deionized water are used as raw material for the preparation of TiO2 thin film. Process parameters for obtaining continuous uniform TiO2 thin film are as follows: the speed of spin-coating is 3000r/min, the pretreatment temperature is 80°C, pretreatment time span is 10 minutes, the heating rate from room temperature to 200°C is 0.5°C/min and 3°C/min at high-temperature. Crystalline film with anatase structure is obtained after annealing at 500°C and the crystallite size of TiO2 thin film is between 30\u2005nm and 80\u2005nm.

Volume 2073
Pages 20006
DOI 10.1063/1.5090660
Language English
Journal None

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