FEA-based heat management of a monochromator at the High Energy Photon Source

Abstract

The finite element method (FEA) was used for thermal mechanical behavior analysis of a monochromator subjected to high heat load for a beamline at the High Energy Photon Source (HEPS). Without using reflection mirror, high energy photons deposit directly on the first crystal of DCM (Double Crystal Monochromator) with power density up to 69W/mm2. This paper introduces an indirect cooling structure with multi-channels cut inside the cooling blocks, which can effectively reduce the crystal deformation caused by high heat deposition. The effects of power and power density on crystal temperature and deformation are compared and its variation discipline with the distance between monochromator and light source (undulator) are studied. The research results have reference significance for thermal management of monochromators as well as other optical elements in HEPS.The finite element method (FEA) was used for thermal mechanical behavior analysis of a monochromator subjected to high heat load for a beamline at the High Energy Photon Source (HEPS). Without using reflection mirror, high energy photons deposit directly on the first crystal of DCM (Double Crystal Monochromator) with power density up to 69W/mm2. This paper introduces an indirect cooling structure with multi-channels cut inside the cooling blocks, which can effectively reduce the crystal deformation caused by high heat deposition. The effects of power and power density on crystal temperature and deformation are compared and its variation discipline with the distance between monochromator and light source (undulator) are studied. The research results have reference significance for thermal management of monochromators as well as other optical elements in HEPS.