2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) | 2019
Modeling 1/f and Lorenzian noise in III-V MOSFETs
Abstract
We present an approach to model 1/f and random telegraph noise in TCAD combining the models for non-local tunneling to traps and generation/recombination noise. The TCAD results are compared with simple numerical expression to understand the influence of the device and trap parameters on the noise spectrum. The simulation deck is then used to compute the low-frequency noise spectrum in III-V MOSFETs using traps distributions extracted from multi-frequency C-V measurements.