2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) | 2019

Modeling 1/f and Lorenzian noise in III-V MOSFETs

 
 
 
 
 
 

Abstract


We present an approach to model 1/f and random telegraph noise in TCAD combining the models for non-local tunneling to traps and generation/recombination noise. The TCAD results are compared with simple numerical expression to understand the influence of the device and trap parameters on the noise spectrum. The simulation deck is then used to compute the low-frequency noise spectrum in III-V MOSFETs using traps distributions extracted from multi-frequency C-V measurements.

Volume None
Pages 1-4
DOI 10.1109/SISPAD.2019.8870548
Language English
Journal 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

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