2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) | 2019

Defect creation and Diffusion under electric fields from first-principles: the prototypical case of silicon dioxide

 
 
 
 
 
 
 
 
 

Abstract


In this paper we study the effect on the electric fields on the formation of bulk Frenkal Pairs and on the migration of oxygen interstitials, IO, and oxygen vacancies, VO, within the framework of Density Functional Theory and Modern Theory of Polarization. At typical OXRRAM field conditions, We show that a significant effect of the electric field is observed only for charged defect. Analyzing the polarization work, we found anomalously high polarization work, for the case of $\\mathbf{I}_{\\mathcal{O}}^{-2}$, with respect to the classical picture of the electric work of an isolated point charge. This large difference has to be ascribed to collective contributions coming from the environment.

Volume None
Pages 1-4
DOI 10.1109/SISPAD.2019.8870555
Language English
Journal 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

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