2019 Workshop on Recent Advances in Photonics (WRAP) | 2019
Amorphous Germanium for Mid Infrared Photonics
Abstract
We present a low-temperature plasma-enhanced-chemical-vapor-deposition of amorphous germanium films for Mid-infrared photonics. A film transparency of 3.2 to 8 μm with a minimum average roughness of 0.26 nm is achieved by tuning the deposition parameters.