Negative Photoresists on the Basis of Copolymers of 2-Chloromethyl-1-(p-Vinyl Phenyl) Cyclopropane with Glycidyl Methacrylate

Abstract

Kazim G. Guliyev, Alvina I. Sadygova, Tsanna D. Gulverdashvili, Afet M. Aliyeva, Dilgam B. Tagiyev Institute of Polymer Materials of Azerbaijan National Academy of Sciences, S.Vurgun Str. 124, Az5004, Sumgait, Azerbaijan Azerbaijan Medical University, biophysical and bioorganic chemistry (sub)department, Bakikhanov Str., 23, Az 1022, Baku, Azerbaijan DOI: 10.31618/asj.2707-9864.2021.2.45.78 Abstract. The radical copolymerization of 2-chloromethyl-1-(p-vinyl phenyl)cyclopropane with glycidyl methacrylate is carried out. The composition and structure of the obtained copolymer are established. The constant values of relative activity of monomers are determined and Q-е parameters on Alfrey-Price are calculated. The photosensitivity of new cyclopropane and epoxy-containing photosensitive copolymers is studied. The photochemical structuring is investigated and it is established that the synthesized polymer has a photosensitivity (56 cm2/J) and can be used for creation of photosensitive material.