Zeitschrift für Physikalische Chemie | 2019

Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis

 
 
 
 
 
 
 
 
 
 
 

Abstract


Abstract The temporal evolution of photogenerated carriers in CuWO4, CuO and WO3 thin films deposited via a direct chemical vapor deposition approach was studied using time-resolved microwave conductivity and terahertz spectroscopy to obtain the photocarrier lifetime, mobility and diffusion length. The carrier transport properties of the films prepared by varying the copper-to-tungsten stoichiometry were compared and the results related to the performance of the compositions built into respective photoelectrochemical cells. Superior carrier mobility was observed for CuWO4 under frontside illumination.

Volume 234
Pages 699 - 717
DOI 10.1515/zpch-2019-1485
Language English
Journal Zeitschrift für Physikalische Chemie

Full Text