The Study on the Effect of Wet and Dry Oxidation of Nickel Thin Film on Sensitivity of EGFET Based pH Sensor

Abstract

The study is based on the use of NiO as an extended gate of field effect transistor (EGFET) using ITO/glass as a substrate for the sensitivity of pH sensor membrane. The NiO thin film was synthesis by wet and dry thermal oxidation method of Nickel metal thin film deposited by RF sputtering. The sensitivity of the NiO membrane was measured and comparatively analysed against the two different oxidation methods. Structural and morphological properties were investigated for both thin films. The sensitivities measurements of the two membranes were made as pH sensors. The results confirmed that NiO membrane grown by dry oxidation had much better sensitivity (87 μA/pH and 54 mV/pH) compared to wet oxidation membrane sample (52 μA/pH and 48 mV/pH).