A. Boosalis

Variable-wavelength frequency-domain terahertz ellipsometry.

We report an experimental setup for wavelength-tunable frequency-domain ellipsometric measurements in the terahertz spectral range from 0.2 to 1.5 THz employing a desktop-based backward wave oscillator source. The instrument allows for variable angles of incidence between 30 degrees and 90 degrees and operates in a polarizer-sample-rotating analyzer scheme. The backward wave oscillator source has a tunable base frequency of 107-177 GHz and is augmented with a set of Schottky diode frequency multipliers in order to extend the spectral range to 1.5 THz. We use an odd-bounce image rotation system in combination with a wire grid polarizer to prepare the input polarization state. A highly phosphorous-doped Si substrate serves as a first sample model system. We show that the ellipsometric data obtained with our novel terahertz ellipsometer can be well described within the classical Drude model, which at the same time is in perfect agreement with midinfrared ellipsometry data obtained from the same sample for comparison. The analysis of the terahertz ellipsometric data of a low phosphorous-doped n-type Si substrate demonstrates that ellipsometry in the terahertz spectral range allows the determination of free charge-carrier properties for electron concentrations as low as 8x10(14) cm(-3).

Hole-channel conductivity in epitaxial graphene determined by terahertz optical-Hall effect and midinfrared ellipsometry

We report noncontact, optical determination of free-charge carrier mobility, sheet density, and resistivity parameters in epitaxial graphene at room temperature using terahertz and midinfrared ellipsometry and optical-Hall effect measurements. The graphene layers are grown on Si- and C-terminated semi-insulating 6H silicon carbide polar surfaces. Data analysis using classical Drude functions and multilayer modeling render the existence of a p-type channel with different sheet densities and effective mass parameters for the two polar surfaces. The optically obtained parameters are in excellent agreement with results from electrical Hall effect measurements.

THz dielectric anisotropy of metal slanted columnar thin films

The anisotropic optical dielectric functions of a metal (cobalt) slanted columnar thin film deposited by electron-beam glancing angle deposition are reported for the terahertz (THz) frequency domain using generalized spectroscopic ellipsometry. We employ a simple effective medium dielectric function homogenization approach to describe the observed optical response. The approach describes isolated, electrically conductive columns which render the thin film biaxial (orthorhombic). Our findings suggest controlled variability of dielectric polarizability and anisotropy in the THz spectral range by choice of geometry, material, and structure.

Visible to vacuum ultraviolet dielectric functions of epitaxial graphene on 3C and 4H SiC polytypes determined by spectroscopic ellipsometry

Spectroscopic ellipsometry measurements in the visible to vacuum-ultraviolet spectra (3.5-9.5 eV) are performed to determine the dielectric function of epitaxial graphene on SiC polytypes, includin ...

Terahertz optical-Hall effect characterization of two-dimensional electron gas properties in AlGaN/GaN high electron mobility transistor structures

The free-charge carrier mobility, sheet density, and effective mass of a two-dimensional electron gas are exemplarily determined in the spectral range from 640 GHz to 1 THz in a AlGaN/GaN heterostructure using the optical-Hall effect at room temperature. Complementary midinfrared spectroscopic ellipsometry measurements are performed for analysis of heterostructure constituents layer thickness, phonon mode, and free-charge carrier parameters. The electron effective mass is determined to be (0.22±0.04)m0. The high-frequency sheet density and carrier mobility parameters are in good agreement with results from dc electrical Hall effect measurements, indicative for frequency-independent carrier scattering mechanisms of the two-dimensional carrier distribution.

Large-area microfocal spectroscopic ellipsometry mapping of thickness and electronic properties of epitaxial graphene on Si- and C-face of 3C-SiC(111)

Microfocal spectroscopic ellipsometry mapping of the electronic properties and thickness of epitaxial graphene grown by high-temperature sublimation on 3C-SiC (111) substrates is reported. Growth of one monolayer graphene is demonstrated on both Si- and C-polarity of the 3C-SiC substrates and it is shown that large area homogeneous single monolayer graphene can be achieved on the Si-face substrates. Correlations between the number of graphene monolayers on one hand and the main transition associated with an exciton enhanced van Hove singularity at ∼4.5 eV and the free-charge carrier scattering time, on the other are established. It is shown that the interface structure on the Si- and C-polarity of the 3C-SiC(111) differs and has a determining role for the thickness and electronic properties homogeneity of the epitaxial graphene.