A. Csik

Interdiffusion in amorphous Si/Ge multilayers by Auger depth profiling technique

It has been shown by the Auger depth profiling technique that the concentration profile at the initially sharp Si/Ge interface in amorphous Si/Ge multilayers shifted but remained still sharp after a heat treatment at 680 K for 100 h. At the same time the fast diffusion of Si resulted in the formation of an almost homogeneous Ge(Si) amorphous solid solution, while there was practically no diffusion of Ge into the Si layer. This is direct evidence on the strong concentration dependence of the interdiffusion coefficient in amorphous Si/Ge system, and it is in accordance with the previous indirect result obtained from the measurements of the decay of the small angle Bragg peaks, as well as with finite difference simulations.

Laser-induced optical changes in amorphous multilayers

It is shown that the well-known blueshift of the fundamental absorption edge in as-deposited compositionally modulated amorphous Si/Ge and As6Se94/Se80Te20 multilayers (with periods of 4–8 nm) is further enhanced due to the thermal or laser-induced intermixing of adjacent layers. The laser-induced intermixing process, as supported by experiments and model calculations, can be attributed to both the local heating and photo-effects in As6Se94/Se80Te20 multilayers, while only the thermal effects were observed for Si/Ge multilayers. Structural transformations, based on this enhanced interdiffusion, provide good capability for spatially patterning optoelectronic devices and digital information recording.

Linear growth kinetics of Nanometric silicides in Co/amorphous-Si and Co/CoSi/amorphous-Si thin films

Evolution of the reaction zone on the nanoscale has been studied in bi- and multilayered Co/a-Si as well as in trilayered Co/a-CoSi/a-Si and Co/CoSi/a-Si thin film diffusion couples. The kinetics of the phase boundary movement during solid state reaction has been followed with special interest of the initial stage of the diffusion, i.e. effects happening on the nanoscale (short time, short distance). The interfacial reactions have been investigated in situ by synchrotron radiation. The formed phases were also characterized by transmission electron microscopy and resistance measurements. The effect of phase nucleation and shift of phase boundaries have been separated in order to determine the “pure” growth kinetics of the crystalline CoSi and Co2Si product phases at the very early stages. Deviations have been found from the traditional diffusion controlled parabolic phase growth. Computer simulations based on a kinetic mean field model illustrated that the diffusion asymmetry (large difference in diffusion...

Nanoscale investigations of shift of individual interfaces in temperature induced processes of Ni–Si system by secondary neutral mass spectrometry

We describe a method for measurement of nanoscale shift of interfaces in layered systems by a combination of secondary neutral mass spectrometry and profilometer. We demonstrate it by the example of the investigation of interface shifts during the solid state reaction in Ni/amorphous-Si system. The kinetics of the shrinkage of the initial nanocrystalline Ni film and the amorphous Si layer as well as the average growth kinetics of the product phases were determined at 503 K. The results show that nanoscale resolution can be reached and the method is promising for following solid state reactions in different thin film systems.

Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

Over the last years, several experimental and theoretical studies of diffusion kinetics on the nanoscale have shown that the time evolution (x∝tkc) differs from the classical Fickian law (kc=0.5). However, all work was based on crystalline samples or models, so far. In this letter, we report on the diffusion kinetics of a thin amorphous Si layer into amorphous Ge to account for the rising importance of amorphous materials in nanodevices. Employing surface sensitive techniques, the initial kc was found at 0.7±0.1. Moreover, after some monolayers of Si dissolved into the Ge, kc changes to the generally expected classical Fickian law with kc=0.5.

Application of Surface Roughness Data for the Evaluation of Depth Profile Measurements of Nanoscale Multilayers

A secondary neutral mass spectrometric (SNMS) depth profile study of electrodeposited Co/Cu multilayers was performed. Depth profile measurements were performed both in the conventional way (i.e., starting the sputtering from the final deposit surface) and in the reverse manner (i.e., detaching the multilayers from the substrate and starting the analysis from the substrate side, which was very smooth as compared to the final deposit surface). The latter method could yield significantly larger intensity fluctuations in the SNMS spectra. Surface roughness data were measured with atomic force microscopy (AFM) for multilayers with different bilayer numbers but otherwise exhibiting the same layer structure as those used for the depth profiling. The experimental AFM surface roughness evolution was used to calculate the result of the depth profile measurements quantitatively. An excellent agreement was obtained between this calculation and the SNMS measurements. It was shown that the decrease in the intensity fluctuations during the depth profile analysis stems mainly from the increase in surface roughness of the samples studied, especially in the conventional sputtering mode. It was also concluded that the thickness fluctuation of the entire multilayer deposit and that of each layer are strongly correlated.

Investigations of diffusion kinetics in Si/Ta/Cu/W and Si/Co/Ta systems by secondary neutral mass spectrometry

Proper understanding of the degradation mechanisms and diffusion kinetics of copper and cobalt interconnections for advanced microelectronics is important from the point of view of fundamental research and technology as well. In this paper Si(substrate)/Ta(10 nm)/Cu(25 nm)/W(10 nm) and Si(substrate)/Co(150 nm)/Ta(10 nm) samples, prepared by DC magnetron sputtering, were in investigated. The samples were annealed at several temperatures ranging from 423 K to 823 K for various times. The composition distributions were detected by means of Secondary Neutral Mass Spectrometry (SNMS). Microstructural characterization of samples was carried out by means of Transmission Electron Microscopy (TEM). It is shown that the changes in the composition profiles were mainly caused by grain boundary, GB, diffusion and the effective GB diffusion coefficients of Ta in Cu were determined both by the ‘‘first appearance’’ and ‘‘centre-gradient’’ methods. The activation energy is 100 kJ/mol. The importance of the Ta penetration into the Cu and its accumulation at the Cu/W interface can lead to an increase of the Ta content in the copper film. This can be an important factor in the change/degradation of the physical parameters (e.g. the electrical resistance) of interconnects. Furthermore a Ta segregation factor in Cu was evaluated. Preliminary results in the Si(substrate)/Co(150 nm)/Ta(10 nm) indicate fast (GB) diffusion of the Si into the Co layer, formation of a cobalt silicide layer at the Co/Si interface and Si accumulation first at the Ta/Co interface and later a retarded accumulation at the free Ta surface. 2010 Elsevier Ltd. All rights reserved.

AFM and TEM study of hydrogenated sputtered Si/Ge multilayers

Multilayers of hydrogenated ultrathin (3 nm) amorphous a- Si and a-Ge layers prepared by sputtering have been studied by atomic force microscopy (AFM) and transmission electron microscopy (TEM) to check the influence of annealing on their structural stability. The annealed multilayers exhibit surface and bulk degradation with formation of bumps and craters whose density and size increase with increasing hydrogen content and/or annealing temperature and time. Bumps are due to the formation of H2 bubbles in the multilayer. The craters are bumps blown up very likely because of too high a gas pressure inside. The release of H from its bonds to Si and Ge occurs within cavities very likely present in the samples. The necessary energy is supplied by the heat treatment and by the recombination of thermally generated carriers. Results by energy filtered TEM on the interdiffusion of Si and Ge upon annealing are also presented.

Study of interdiffusion in amorphous Si/Ge multilayers by Rutherford backscattering spectrometry

Abstract Amorphous Si/Ge multilayers of 10–40 nm repeat length were prepared by DC magnetron sputtering and annealed at 683 K. Rutherford backscattering spectrometry (RBS) with increased depth resolution was applied to study the intermixing of the elements. The interdiffusion coefficient was determined by measuring the intensity of the first Ge peak in the RBS spectrum as a function of annealing time. An attempt was made to observe the theoretically predicted change of dimensions of the Si/Ge layers caused by the diffusion asymmetry.

On the Feasibility to Study Inverse Proximity Effect in a Single S/F Bilayer by Polarized Neutron Reflectometry ¶

Here we report on a feasibility study aiming to explore the potential of Polarized Neutron Reflectometry (PNR) for detecting the inverse proximity effect in a single superconducting/ferromagnetic bilayer. Experiments, conducted on the V (40 nm)/Fe (1 nm) S/F bilayer, have shown that experimental spin asymmetry measured at T = 0.5TC is shifted towards higher Q values compared to the curve measured at T = 1.5TC. Such a shift can be described by the appearance in superconducting vanadium of magnetic sublayer with a thickness of 7 nm and a magnetization of +0.8 kG.