A. G. Poleshchuk

Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure

A precision laser pattern generator for writing arbitrary diffractive elements was developed as an alternative to Cartesian coordinate laser/electron-beam writers. This system allows for the fabrication of concentric continuous-relief and arbitrary binary patterns with minimum feature sizes of less than 0.6 microm and position accuracy of 0.1 microm over 300-mm substrates. Two resistless technologies of writing on chromium and on amorphous silicon films were developed and implemented. We investigated limit characteristics by writing special test structures. A 58-mm f/1.1 zone plate written directly is demonstrated at a lambda/50 rms wave-front error corresponding to a 0.06-microm pattern accuracy. Several examples of fabricated diffractive elements are presented.

Asphere testing with a Fizeau interferometer based on a combined computer-generated hologram

Fizeau interferometers with an additional diffractive optical element are frequently used for measuring spherical and aspherical surfaces. We present a new (to our knowledge) optical test method, in which the Fizeau principle is now perfectly fulfilled by generating reference and measuring wavefront on the last optical surface, which carries a diffractive optical element. This method has been examined experimentally by testing a reference f/0.68 spherical mirror and can be applied identically for testing aspheres. Several advantages of this method are discussed and proved experimentally.

Combined computer-generated hologram for testing steep aspheric surfaces

A novel type of a combined (or multiplex) computer-generated hologram (CGH) and a method for interferometric testing of steep axially symmetric aspheres is presented. The method is based on a hybrid CGH containing two different diffractive structures. The presented new type of Diffractive Fizeau Null Lens (DFNL) design eliminates the transmitted wavefront distortion (TWD) of the CGH substrate and increases the accuracy of the surface test. The method was approved by testing a spherical reference mirror with an f-number of f/0.65.

Shack-Hartmann sensor based on a low-aperture off-axis diffraction lens array

A Shack-Hartmann type wavefront sensor designed on the basis of a low-aperture off-axis diffraction lens array is described. Tests experiments showed that the sensor is capable of measuring wavefront slopes at array subapertures of size 640×640 µm with an error not exceeding 4.80 arcseconds (0.15 pixel), which corresponds to the standard deviation (SD) (SD = 0.0170λ) at the reconstructed wavefront. Advantages of the array used in the sensor and the technology of its manufacture are discussed. The sensor tested in the experiments can be used to measure atmospheric turbulence parameters and as an element of adaptive optical imaging systems.

Alignment of the writing beam with the diffractive structure rotation axis in synthesis of diffractive optical elements in a polar coordinate system

A method is developed to ensure precise alignment of the origin of a polar coordinate system in which the laser beam position is defined in writing diffractive optical elements with the optical workpiece rotation axis. This method is used to improve the accuracy of a circular laser writing system in writing large-scale diffractive optical elements in a polar coordinate system. Results of studying new algorithms of detection and correction of positioning errors of the circular laser writing system in the course of writing are reported.

Microstructuring of optical surfaces: Technology and device for direct laser writing of diffractive structures

Results of development and testing of a scanning system of interference lithography are presented. The system is designed to form diffractive microstructures consisting of microgratings with a specified orientation, a size of 5–10 µm, and a period ranging from 0.6 to 1.5 µm. The total writing field of the system is 300 × 300 mm. The system is used to study direct laser writing of microgratings on chromium and amorphous silicon films applied by the method of magnetron sputtering onto the glass substrate surfaces. The device and technology of direct writing of microgratings can be further used to form antireflective subwave coatings of optical elements and graphical microstructured identification marks for product protection and also to manufacture diffractive attenuators of laser radiation.

Aspherical wavefront shaping with combined computer generated holograms

Abstract. The problem of metrological standards development for aspherical wavefronts is discussed. A method for aspherical wavefront shaping by means of combined (or twin, multiplexed) computer generated hologram (CCGH) is presented. The CCGH reconstructs two wavefronts: the first one is used for calibration of the second one by means of a Fizeau interferometer and a highly reflective flat reference surface. Different CCGH encoding methods are discussed. The design of a CCGH with subaperture division in the shape of angular sectors is presented. The absence of cross-talk errors in both wavefronts was demonstrated experimentally.

Multibeam laser writing of diffractive optical elements

A new version of the method of direct multibeam laser writing of diffractive optical elements (DOE) is proposed and investigated. A writing area in the form of an array of focused light spots is formed by splitting the writing laser beam into multiple beams by using a Dammann grating and focusing of these beams in the plane of a moving carrier with a photosensitive material. Adjustment of the radial pitch of writing and correction of the uniformity of the beam intensity is carried out by tilting the Dammann grating and displacing it in the dispersion direction. In writing DOEs, the radial pitch of discrete displacement of the writing area with respect to the plane of the DOE is set equal to or multiple of the average radial distance between the radial projections of the centers of the focused light spots. This version provides improved performance and accuracy due to high-quality paralleling of the writing beam and the averaging effect in superimposed writing.

Laser-Induced Local Oxidation of Thin Metal Films: Physical Fundamentals and Applications

Local laser oxidation of thin metal films allows recording of an optical image on thin films with the highest resolution and high productivity at the same time, and without distortions specific to laser ablation. A technique for writing of diffractive optical elements was developed on the basis of this process. Laser-matter interaction physics and laser technology underlying this method are described in this chapter.

Etch depth mapping of phase binary computer-generated holograms by means of specular spectroscopic scatterometry

Abstract. Detailed analysis of etch depth map for phase binary computer-generated holograms intended for testing aspheric optics is a very important task. In particular, diffractive Fizeau null lenses need to be carefully tested for uniformity of etch depth. We offer a simplified version of the specular spectroscopic scatterometry method. It is based on the spectral properties of binary phase multi-order gratings. An intensity of zero order is a periodical function of illumination light wave number. The grating grooves depth can be calculated as it is inversely proportional to the period. Measurement in reflection allows one to increase the phase depth of the grooves by a factor of 2 and measure more precisely shallow phase gratings. Measurement uncertainty is mainly defined by the following parameters: shifts of the spectrum maximums that occur due to the tilted grooves sidewalls, uncertainty of light incidence angle measurement, and spectrophotometer wavelength error. It is theoretically and experimentally shown that the method we describe can ensure 1% error. However, fiber spectrometers are more convenient for scanning measurements of large area computer-generated holograms. Our experimental system for characterization of binary computer-generated holograms was developed using a fiber spectrometer.