A. R. Peaker

Laplace-transform deep-level spectroscopy: the technique and its applications to the study of point defects in semiconductors

We present a comprehensive review of implementation and application of Laplace deep-leve1 transient spectroscopy (LDLTS). The various approaches that have been used previously for high-resolution DLTS are outlined and a detailed description is given of the preferred LDLTS method using Tikhonov regularization. The fundamental limitations are considered in relation to signal-to-noise ratios associated with the measurement and compared with what can be achieved in practice. The experimental requirements are discussed and state of the art performance quantified. The review then considers what has been achieved in terms of measurement and understanding of deep states in semiconductors through the use of LDLTS. Examples are given of the characterization of deep levels with very similar energies and emission rates and the extent to which LDLTS can be used to separate their properties. Within this context the factors causing inhomogeneous broadening of the carrier emission rate are considered. The higher resoluti...

Laplace transform deep‐level transient spectroscopic studies of defects in semiconductors

A quantitative improvement in deep‐level transient spectroscopy (DLTS) resolution has been demonstrated by using Laplace transform method for the emission rate analysis. Numerous tests performed on the software used for the calculations as well as on the experimental setup clearly demonstrated that in this way the resolution of the method can be increased by more than an order of magnitude. Considerable confidence in this approach was gained through measurements of a selection of well‐characterized point defects in various semiconductors. The results for platinum in silicon and EL2 in GaAs are presented. For each of these cases conventional DLTS give broad featureless lines, while Laplace DLTS reveals a fine structure in the emission process producing the spectra.A quantitative improvement in deep‐level transient spectroscopy (DLTS) resolution has been demonstrated by using Laplace transform method for the emission rate analysis. Numerous tests performed on the software used for the calculations as well as on the experimental setup clearly demonstrated that in this way the resolution of the method can be increased by more than an order of magnitude. Considerable confidence in this approach was gained through measurements of a selection of well‐characterized point defects in various semiconductors. The results for platinum in silicon and EL2 in GaAs are presented. For each of these cases conventional DLTS give broad featureless lines, while Laplace DLTS reveals a fine structure in the emission process producing the spectra.

Electronic properties of antimony-vacancy complex in Ge crystals

Schottky barriers formed by depositing Au on n-type Ge have been used to study the antimony-vacancy complex (E center). Both hole and electron transitions have been observed because the formation of an inversion layer at the semiconductor surface enables minority carriers to be injected when the Schottky barrier is forward biased. It is argued that the E center in Ge has three charge states: double negative, single negative, and neutral. The free energy of electron ionization for the double acceptor level of the complex has been found to be ΔG(=/−)=0.294−4.2 kT (eV), where k is Boltzmann’s constant. Consequently, the position of the double acceptor level of the E center {E(=/−)=Ec−ΔG(=/−)} is temperature dependent. In moderately Sb-doped (NSb=1013–1015 cm−3) Ge crystals at equilibrium conditions half-occupancy of the double acceptor state of the Sb-V complex occurs when the Fermi level is at about Ec−0.20 eV. The single acceptor level of the E center is in the lower part of the band gap. The activation en...

Electronic properties of vacancy–oxygen complex in Ge crystals

It is argued that the vacancy-oxygen (VO) complex (A center) in Ge has three charge states: double negative, single negative, and neutral. Corresponding energy levels are located at E-c-0.21 eV (VO--/-) and E-v+0.27 eV (VO-/0). An absorption line at 716 cm(-1) has been assigned to the asymmetrical stretching vibration mode of the doubly negatively charged VO complex

Growth and structural characterization of molecular beam epitaxial erbium-doped GaAs

Abstract Elemental erbium from a thermal effusion cell has been used to dope gallium arsenide grown by molecular beam epitaxy with erbium concentrations of 4 × 10 16 to 2 × 10 20 cm -3 . No incorporation dependence on substrate temperature was observed over the range 540–630°C. Transmission electron microscopy has revealed a solubility limit of erbium in GaAs of approximately 7 × 10 17 cm -3 at 580°C. Above this concentration, erbium is incorporated primarily as near spherical micro-precipitates which possess a cubic (rocksalt) structure consistent with their chemical composition being ErAs. The precipitate size during the molecular beam epitaxial growth is dependent primarily on the substrate temperature and can be controlled in the 10–20 A range. Larger precipitates produce misfit dislocations and are no longer spherical. The mechanism represents a simple method for the fabrication of quantum dots distributed uniformly in three dimensions.

Deep‐state‐controlled minority‐carrier lifetime in n‐type gallium phosphide

Details of a method for the characterization of deep levels with large capture cross sections for minority carriers are presented. This technique has been used to investigate centers in gallium phosphide. Two defects at EV+0.75 eV and EV+0.95 eV are described in detail. Evidence is presented that shows that the shallower of these defects can control the minority‐carrier lifetime in n‐type gallium phosphide and in fact is the dominant recombination center in most epitaxial layers of this material. The technique uses capacitance as a measure of the charge state of the deep levels in the depletion region of a Schottky barrier. This charge state is perturbed by the capture and subsequent thermal emission of minority carriers. The carriers are generated by irradiation of the semiconductor with low‐intensity light at a wavelength near the absorption edge. Minority carriers generated in the neutral material within about a diffusion length of the barrier region are extracted by the depletion field. Majority carri...

Recombination processes in erbium-doped MBE silicon

The incorporation of erbium from a solid source into molecular beam epitaxy (MBE) Si and Si/Ge alloys grown at substrate temperatures of 500 degrees C and 700 degrees C has been studied by photoluminescence, electrical measurements, secondary-ion mass spectrometry (SIMS), Rutherford backscattering (RBS) and transmission electron microscopy (TEM). Erbium concentrations between 1018 and 1022 cm-3 were obtained but the maximum photoluminescence intensity was from samples with an erbium concentration of 2*1018 cm-3. Above this concentration the onset of erbium precipitation could just be observed by TEM. The authors found no shallow donors or acceptors attributable to erbium but they observed a high concentration of deep acceptors with an activation energy of 360 meV; these may be due to impurities in the erbium source rather than being directly related to the rare earth. Implantation with oxygen is found to enhance the Er3+-related photoluminescence signal when measured at temperatures greater than 77 K but to have little effect on the low-temperature luminescence. A detailed study of the temperature dependence of the luminescence reveals tree quenching mechanisms with average activation energies of approximately 5, 20 and 130 meV. The authors attribute the first two to de-excitation effects in the matrix, and the last to processes competing with the internal 4f transition.

Stress-Induced Positive Charge in Hf-Based Gate Dielectrics: Impact on Device Performance and a Framework for the Defect

A Hf-based dielectric has been selected to replace SiON for CMOS technologies. When compared with SiON, Hf dielectrics can suffer from higher instability. Previous attentions were focused on electron trapping, and positive charging received less attention. The objective of this paper is to study the impact of positive charging on device performance and to provide a framework for the defect. Three components of threshold voltage instability Delta Vth are unambiguously identified for pMOSFETs, i.e., loop, loop-shift, and up-loop. The loop dominates Delta Vth at a relatively short time (< 1 s). After stressing for a longer time, the whole loop is shifted in the negative direction. Unlike the loop, the up-loop cannot readily be recharged after recovery. In addition to the generated interface states, three different types of positive charges are formed in the Hf-based stacks, i.e., cyclic positive charges (CPC), antineutralization positive charges (ANPC), and as-grown hole trapping (AHT). Each type of defect has its unique signatures and properties. CPC can repeatedly be charged and discharged by alternating the gate bias polarity. ANPC is more difficult to neutralize, whereas AHT is harder to charge. Both the generated interface states and the AHT saturate at longer stress time, but ANPC does not. ANPC reduces at higher measurement temperature, but CPC is insensitive to temperature. The relation between each type of defect and each component of Delta Vth is clarified.

Capacitance and conductance deep level transient spectroscopy in field‐effect transistors

An analysis of conductance transients in field‐effect transistors for small values of drain‐source voltage is presented which enables absolute values of trap concentration to be evaluated. The relationships use parameters which can be easily measured as distinct from the estimated values of mobility profiles used in previously published calculations. Excellent quantitative agreement between capacitance and conductance results on large area gallium arsenide field‐effect transistors has been obtained. In addition, conductance deep level transient studies have demonstrated that the method of measurement and analysis can be used for micron and submicron devices which are much too small for capacitive measurements.

The oxygen dimer in Si: Its relationship to the light-induced degradation of Si solar cells?

It is widely believed that the light induced degradation of crystalline silicon solar cells is due to the formation of a BsO2i recombination center created by the optically excited migration of the oxygen dimer (charge-state-driven motion). In this letter the concentration dependence of the neutral state of O2i on [Oi] in p- and n-type Cz–Si has been determined using infrared absorption. A systematic search for the absorption signature of the dimer in the doubly positively charged state has been unsuccessful. These data strongly suggest that charge-state-driven motion (Bourgoin–Corbett mechanism) of the oxygen dimer cannot occur in typical solar silicon and hence bring into question the accepted degradation mechanism.