A. S. Zubrilov

Defect-related tunneling mechanism of efficiency droop in III-nitride light-emitting diodes

The quantum efficiency of GaN-based light-emitting diodes (LEDs) is investigated at temperatures 77–300 K. It is found that the efficiency droop is due to a decrease in the internal quantum efficiency (IQE) in the low-energy part of the emission spectrum. The efficiency starts to decrease at a temperature independent forward voltage of Umax≈2.9 V. At this voltage tunneling current through the LED-structure begins to dominate. It is suggested that the external quantum efficiency droop is related to reduction of the IQE due to tunneling leakage of carriers from the quantum well (QW) to defect states in barriers, and to reduction of the injection efficiency by excess tunneling current under QW through deep defect states in barriers.

White electroluminescence from ZnO/GaN structures

White electroluminescence (EL) from ZnO/GaN structures fabricated by pulsed laser deposition of ZnO:In onto GaN:Mg/GaN structures MOCVD-grown on Al2O3 substrates has been observed. The white light is produced by superposition of the two strongest emission lines, narrow blue and broad yellow, peaked at 440 and 550 nm, respectively. The intensity ratio of different EL lines from ZnO/GaN/Al2O3 structures depends on the ZnO film quality and drive current. The white EL is due to the high density of structural defects at the n-ZnO/p-GaN interface. A band diagram of the n-ZnO/p-GaN/n-GaN structure is constructed and a qualitative explanation of the EL is suggested.

Mechanism of the GaN LED efficiency falloff with increasing current

The quantum efficiency of GaN LED structures has been studied at various temperatures and biases. It was found that an efficiency falloff is observed with increasing current density and, simultaneously, the tunnel component of the current through the LED grows and the quasi-Fermi levels reach the mobility edge in the InGaN active layer. It is shown that the internal quantum efficiency falloff with increasing current density is due to the carrier leakage from the quantum well as a result of tunnel transitions from its band-tail states to local defect-related energy levels within the energy gaps of the barrier layers.

Optical properties of gallium nitride bulk crystals grown by chloride vapor phase epitaxy

The optical properties of bulk crystals of gallium nitride grown by chloride vapor-phase epitaxy are investigated. It is shown that these crystals exhibit exciton luminescence bands. Analysis of the energy positions of the band maxima imply certain conclusions about the presence or absence of mechanical stresses in the bulk crystals of GaN obtained. Analysis of the luminescence spectra also reveals that the temperature dependence of the width of the GaN band gap Eg in the temperature range T=6–600 K is well described by the expression Eg(T)=3.51−7.4×10−4T2(T+600)−1 eV. It is estimated that values of the free electron concentration in these crystals do not exceed 1018 cm−3. The optical characteristics of the bulk GaN crystals are compared analytically with literature data on bulk crystals and epitaxial layers of GaN grown by various methods.

Effect of localized tail states in InGaN on the efficiency droop in GaN light-emitting diodes with increasing current density

The mechanism of the internal quantum efficiency droop in InGaN/GaN structures with multiple quantum wells at current densities of up to 40 A cm−2 in high-power light-emitting diodes is analyzed. It is shown that there exists a correlation between the efficiency droop and the broadening of the high-energy edge of the emission spectrum with increasing current density. It is also demonstrated that the efficiency is a spectrum-dependent quantity and the emission of higher energy photons starts to decrease at higher current densities. The effect of tunneling and thermally activated mechanisms of thermalization of carriers captured into shallow band-tail states in the energy gap of InGaN on the efficiency and the emission spectrum’s shape is considered. Analysis of the results obtained suggests that the efficiency droop occurs at high current densities because of the relative rise in the contribution from nonradiative recombination via defect states as a result of the increasing occupancy of deep band-tail states in InGaN. It is shown that power efficiency close to the theoretical limit can be obtained in the case of low-voltage tunnel injection into localized band-tail states in the InGaN active region.

On the laser detachment of n-GaN films from substrates, based on the strong absorption of IR light by free charge carriers in n+-GaN substrates

The physical and technological basics of the method used to lift off lightly and moderately doped n-GaN films from heavily doped n+-GaN substrates are considered. The detachment method is based on the free-charge-carrier absorption of IR laser light, which is substantially higher in n+-GaN films.

Effect of the electric field on the intensity and spectrum of emission from InGaN/GaN quantum wells

Comparative study of the photoluminescence (PL) from quantum wells (QWs) in forward-biased p-GaN/InGaN/n-GaN structures and electroluminescence from these structures has been carried out. It is shown that, upon application of a forward bias, a characteristic red shift of the spectral peak is observed, together with a broadening of the PL line and simultaneous burning-up of the PL. This results from a decrease in the field strength in the space charge region of the p-n junction and suppression of the tunneling leakage of the carrier from band-tail states in the active InGaN layer. An analysis of the results obtained demonstrated that the tunneling strongly affects the quantum efficiency and enabled evaluation of the internal quantum efficiency of the structures. It is shown that nonequilibrium population of band-tail states in InGaN/GaN QWs depends on the injection type and is controlled by the capture of carriers injected into a QW, in the case of optical injection, and by carrier tunneling “below” the QW under electrical injection.

Study of the 3C-SiC layers grown on the 15R-SiC substrates

The 3C-SiC layers grown on the 15R-SiC substrates by sublimation epitaxy in vacuum are studied. Using X-ray topography and Raman spectroscopy, it is shown that the obtained layers are of a rather high structural quality. By the data of the Raman spectroscopy and capacitance-voltage measurements, it is established that the electron concentration in the 3C-SiC layer is (4–6) × 1018 cm−3.

Electrical properties of n-GaN/p-SiC heterojunctions

Epitaxial GaN layers were grown by hydride vapor phase epitaxy (HVPE) on commercial (CREE Inc., USA) p+-6H-SiC substrates (Na − Nd ≈ 7.8 × 1017 cms−3) and n+-6H-SiC Lely substrates with a predeposited p+-6H-SiC layer. A study of the electrical properties of the n-GaN/p-SiC heterostructures obtained confirmed their fairly good quality and demonstrated that the given combination of growth techniques is promising for fabrication of bipolar and FET transistors based on the n-GaN/p-SiC heterojunctions.

On the laser lift-off of lightly doped micrometer-thick n -GaN films from substrates via the absorption of IR radiation in sapphire

The intense absorption of CO2 laser radiation in sapphire is used to separate GaN films from GaN templates on sapphire. Scanning of the sapphire substrate by the laser leads to the thermal dissociation of GaN at the GaN/sapphire interface and to the detachment of GaN films from the sapphire. The threshold density of the laser energy at which n-GaN started to dissociate is 1.6 ± 0.5 J/cm2. The mechanical-stress distribution and the surface morphology of GaN films and sapphire substrates before and after laser lift-off are studied by Raman spectroscopy, atomic-force microscopy, and scanning electron microscopy. A vertical Schottky diode with a forward current density of 100 A/cm2 at a voltage of 2 V and a maximum reverse voltage of 150 V is fabricated on the basis of a 9-μm-thick detached n-GaN film.