A. Sanin

Multiaperture negative ion source

The long-pulse multiaperture surface-plasma source with negative ion production on a cesiated grid is under construction at Budker Institute. The ion source includes RF plasma driver, an expansion chamber with multicusp magnetic filed, an external magnetic filter and a four-electrode ion-optical system for beam extraction and acceleration. The projected parameters of the ion source are: beam current 1.5 A, beam energy 120 keV, pulse duration 100 s, RF power in plasma 40 kW, hydrogen filling pressure < 0.5 Pa, e/H− ratio 1:1, H− ions emission current density 30 mA/cm2.

Inductively driven surface-plasma negative ion source for N-NBI use (invited)

The long-pulse surface-plasma source prototype is developed at Budker Institute of Nuclear Physics for negative-ion based neutral beam injector use. The essential source features are (1) an active temperature control of the ion-optical system electrodes by circulation of hot thermal fluid through the channels, drilled in the electrode bodies, (2) the concaved transverse magnetic field in the extraction and acceleration gaps, preventing the electrons trapping and avalanching, and (3) the directed cesium deposition via distribution tubes adjacent to the plasma grid periphery. The long term effect of cesium was obtained just with the single cesium deposition. The high voltage strength of ion-optical system electrodes was improved with actively heated electrodes. A stable H(-) beam with a current ∼1 A and energy 90 keV was routinely extracted and accelerated.

Development of a negative ion-based neutral beam injector in Novosibirska)

A 1000 keV, 5 MW, 1000 s neutral beam injector based on negative ions is being developed in the Budker Institute of Nuclear Physics, Novosibirsk in collaboration with Tri Alpha Energy, Inc. The innovative design of the injector features the spatially separated ion source and an electrostatic accelerator. Plasma or photon neutralizer and energy recuperation of the remaining ion species is employed in the injector to provide an overall energy efficiency of the system as high as 80%. A test stand for the beam acceleration is now under construction. A prototype of the negative ion beam source has been fabricated and installed at the test stand. The prototype ion source is designed to produce 120 keV, 1.5 A beam.

Efficient cesiation in RF driven surface plasma negative ion source

Experiments on hydrogen negative ions production in the large radio-frequency negative ion source with cesium seed are described. The system of directed cesium deposition to the plasma grid periphery was used. The small cesium seed (∼0.5 G) provides an enhanced H(-) production during a 2 month long experimental cycle. The gradual increase of negative ion yield during the long-term source runs was observed after cesium addition to the source. The degraded H(-) production was recorded after air filling to the source or after the cesium washing away from the driver and plasma chamber walls. The following source conditioning by beam shots produces the gradual recovery of H(-) yield to the high value. The effect of H(-) yield recovery after cesium coverage passivation by air fill was studied. The concept of cesium coverage replenishment and of H(-) yield recovery due to sputtering of cesium from the deteriorated layers is discussed.

Effect of plasma grid bias on extracted currents in the RF driven surface-plasma negative ion source

Extraction of negative ions from the large inductively driven surface-plasma negative ion source was studied. The dependencies of the extracted currents vs plasma grid (PG) bias potential were measured for two modifications of radio-frequency driver with and without Faraday screen, for different hydrogen feeds and for different levels of cesium conditioning. The maximal PG current was independent of driver modification and it was lower in the case of inhibited cesium. The maximal extracted negative ion current depends on the potential difference between the near-PG plasma and the PG bias potentials, while the absolute value of plasma potential in the driver and in the PG area is less important for the negative ion production. The last conclusion confirms the main mechanism of negative ion production through the surface conversion of fast atoms.

Negative ion production in the RF multiaperture surface-plasma source

The experiments on negative hydrogen ion beam production in a multi-aperture long-pulse surface-plasma source are described. H- ions are produced on the surface of a plasma grid covered by cesium and illuminated by fast plasma particles. The source uses a radio-frequency driver to generate plasma. A composite magnet system made of external permanent magnets confines and filters electrons in the plasma region, and deflects them in the extraction area. A multiaperture, multi-electrode ion optical system is used for beam formation. The electrode heating and cooling during long pulses is accomplished by circulating a heat transfer fluid through channels drilled in the electrodes bodies. H- ions extraction through a single aperture and 21 apertures was performed and studied. A stable H- beam with the current up to 0.7 A, energy up to 74 kV, and pulse duration up to 7 s was routinely obtained

Operation of RF driven negative ion source in a pure-hydrogen mode

The production of negative hydrogen ions in the radio-frequency driven long-pulsed source with external antenna is studied. RF drivers with various geometry of external antenna, Faraday shield and magnets at the rear flange were examined. H- beam extraction through the single emission aperture was performed in the source pure-hydrogen mode with no external seed of alkali additives. H- beam with ion emission current density up to 5 mA/cm2 and energy up to 75 keV was regularly obtained in the 1 s pulses of the pure-hydrogen mode. The regular temporal increase of H- ion production due to deposition of impurities on the plasma grid surface was recorded. The H- emission current density increased up to 9 mA/cm2 in this case.The production of negative hydrogen ions in the radio-frequency driven long-pulsed source with external antenna is studied. RF drivers with various geometry of external antenna, Faraday shield and magnets at the rear flange were examined. H- beam extraction through the single emission aperture was performed in the source pure-hydrogen mode with no external seed of alkali additives. H- beam with ion emission current density up to 5 mA/cm2 and energy up to 75 keV was regularly obtained in the 1 s pulses of the pure-hydrogen mode. The regular temporal increase of H- ion production due to deposition of impurities on the plasma grid surface was recorded. The H- emission current density increased up to 9 mA/cm2 in this case.

Upgrade of CW negative hydrogen ion source

The CW surface-plasma source of H− ions was upgraded for increase the source lifetime and the high voltage holding. Basic improvements include the modification of magnetic system, the placement of anode collar between the dense discharge plasma region and the H− emission area, the increase of emission and ion-optical system aperture diameters and enforcing the power supplies to sustain the higher currents. Several long term runs with duration ∼1 hour each and negative ion beam current of 25 mA were performed. Direct measurements of H− beam profile and emittance were carried out by an electric sweep scanner. No saturation of the CW H− beam current with the discharge current increase was recorded.

A 15 mA CW H‐ Source for Accelerators

A cw surface‐plasma type negative ion source has been developed. H‐ beam with current 15 mA and energy of 32 keV is regularly produced in the runs with duration >102 hours. Unattended operation of the source under computer control is realized. The source has a simplified maintenance and an easy access to consumable parts.

High voltage holding in the negative ion sources with cesium deposition

High voltage holding of the large surface-plasma negative ion source with cesium deposition was studied. It was found that heating of ion-optical system electrodes to temperature >100 °C facilitates the source conditioning by high voltage pulses in vacuum and by beam shots. The procedure of electrode conditioning and the data on high-voltage holding in the negative ion source with small cesium seed are described. The mechanism of high voltage holding improvement by depletion of cesium coverage is discussed.