A. Tanaka
Shizuoka University
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Publication
Featured researches published by A. Tanaka.
Journal of Crystal Growth | 2002
A. Tanaka; N. Shiozaki; Hironobu Katsuno
Abstract In order to reduce the growth temperature of SiC crystals, Ga–Al–Si and/or Sn–Al–Si solution, in which the Si content was just below the saturation value, was reacted with C 3 H 8 gas at 950°C. After a 10xa0h-reaction, many small crystals were found in the solution. X-ray diffraction measurements revealed that the crystals are 3C-SiC. Using the wetting solution of these solutions, 3C-SiC crystal layers could be grown on a 6H-SiC substrate.
Journal of Crystal Growth | 2003
A. Tanaka; Y. Funayama; T. Murakami; Hironobu Katsuno
Abstract A new method of GaN growth from Ga solution with NH 3 has been developed. The method is characterized by the use of a thin layer of Ga wetting solution formed on a rotating substrate and chemical reaction with NH 3 at the solution surface. The growth experiments, performed at 980°C with NH 3 supply rate of 9xa0sccm for 30xa0h, resulted in the layer mode growth of about 4xa0μm thickness on a part of Si-face of a 6H–SiC substrate. The thickness of wetting solution required for creating suitable super-saturation is discussed.
Journal of Crystal Growth | 1996
Masakazu Kimura; Sadik Dost; H. Udono; A. Tanaka; Tokuzo Sukegawa; Z. Qin
Abstract A computational model for the mass transport occuring during the conversion of GaAs to GaAsP on a GaP substrate is presented. The mass transport equations in the liquid and solid phases, and the equations describing phase diagram constitute the governing equations. These equations together with appropriate interface and boundary conditions were solved numerically by the finite element method. Numerical solutions agree with experimental results and explain well the conversion phenomenon. The conversion process is initiated by the non-equilibrium condition between the Ga As P solution and the GaAs layer and promoted by the rapid diffusion of V elements into the GaAs (GaAsP conversion) layer.
Journal of Crystal Growth | 1993
Shinichi Watabe; Kazuyuki Tadatomo; Tokuzo Sukegawa; A. Tanaka
Abstract A new process for the yo-yo solute feeding method has been developed to grow a thick Ga x In 1−x P alloy layer. In this process, we lowered the temperature of every cycle by 5°C. Only after three cycles was a Ga 0.69 In 0.31 P layer of about 70 μm in thickness epitaxially grown on a GaAsP(100) substrate. The thick layer shows the FWHM of PL (photoluminescence) peaks of 37.2 meV at 300 K and 13.7 meV at 4 K, which indicates high quality comparable with normal LPE-grown thin layers.
Applied Surface Science | 1997
Tokuzo Sukegawa; Hironobu Katsuno; S. Kawaguchi; Masakazu Kimura; A. Tanaka
Abstract It has been found that GaAs grown on GaP substrate was converted to GaN by annealing in the flow of NH3. Using LPE, a GaAs layer of 5 μm thickness was grown on a GaP (111)B substrate. Then the GaAs layer was annealed in the flow of 100% NH3 for 30–60 min at 800–850°C. The GaAs layer was completely converted to GaN. X-ray diffraction measurements suggested that the GaN layer had mainly the zinc blende structure.
Applied Surface Science | 1997
Masakazu Kimura; Z. Qin; Sadik Dost; H. Udono; A. Tanaka; Tokuzo Sukegawa
Abstract A computational model for mass transport occurring during the conversion of GaAs to GaAsP on a GaP substrate is presented. The mass transport equations in the liquid and solid phases, and the phase diagram together with appropriate interface and boundary conditions were solved numerically by the finite element method. Numerical solutions agree with experimental results and explain well the conversion phenomenon. The conversion process is initiated by the non-equilibrium condition between the Gaue5f8Asue5f8P solution and the GaAs layer and promoted by the rapid diffusion of V elements into the GaAs (GaAsP conversion) layer. Further analysis shows that the period required for the conversion increases parabolically with increasing thickness of the GaAs layer.
The Japan Society of Applied Physics | 2008
Y. Ogawa; Atsushi Nakamura; A. Tanaka; Jiro Temmyo
1.Introduction Graphene is a carbon nano-system with two-dimensional layers of one-atom-thick, and have extraordinary electronic transport properties, which have attracted attention due to its potential for applications in nanoelectronics. Pyrolysis of SiC system in vacuum is known to be a very simple way for formation of grapene layers and multiwalled CNTs (MWNT). By using this method, we also have demonstrated single wall nanotubes (SWNTs) formation from single 6H-SiC substrates via hydrogenincorporated pyrolysis and multilayered graphene formation from amorphous SiC (a-SiC) films. However, there have been very few experimental results on carbon nano-system formation via pyrolysis in vacuum and its growth mechanism and controllability are controversial as yet. In this paper, we describe multilayerd graphene formation from SiC films grown by hot-wire MOCVD via pyrolysis in vacuum.
Materials Science and Engineering B-advanced Functional Solid-state Materials | 1997
Masakazu Kimura; Z. Qin; H. Udono; Sadik Dost; A. Tanaka; Tokuzo Sukegawa
Abstract A computational model for mass transport occurring during the conversion of GaAs to GaAsP on a GaP substrate is presented. The mass transport equations in the liquid and solid phases, and the phase diagram together with appropriate interface and boundary conditions were solved numerically by the finite element method (FEM). Numerical solutions agree with experimental results and explain well the conversion phenomenon.
Journal of Crystal Growth | 2011
M. Arivanandhan; Yuya Saito; T. Koyama; Yoshimi Momose; Hiroya Ikeda; A. Tanaka; T. Tatsuoka; D. K. Aswal; Yuko Inatomi; Y. Hayakawa
Journal of Crystal Growth | 2004
A. Tanaka; T. Ataka; E. Ohkura; Hironobu Katsuno