Adam M. Payne

Tunable thin-film filters based on thermo-optic semiconductor films

Thermo-optic layers of thin film semiconductors are deposited by PEVCD to create thermally tunable bandpass filters for WDM optical networks. Amorphous semiconductor films, adapted from the solar cell and display industries, are the primary ingredient. Single-cavity tunable filters with FWHM=0.085 nm, >40 nm tuning range, and insertion losses 0.2-4 dB are demonstrated. Key enablers for this new family of index-tunable thin film devices are PECVD deposition, large internal temperature changes >400C, high conductivity polysilicon heater films, and extremely robust film adhesion. Possible applications include optical monitoring, add/drop multiplexing, dynamic gain equalization, and dispersion compensation.

ZnO semiconductors for lighting

Intentionally doped n-type bulk ZnO has been grown by patented melt technique at Cermet and was used as a substrate for homo-epitaxial growth of p-type ZnO films. The n-type ZnO has a carrier concentration on the order of 1018cm-3 with a mobility of 113cm2/Vs, which is good for optical devices. Secondary ion mass spectroscopy (SIMS) profile shows a very uniform distribution of n-type dopant in the ZnO. Excellent transmission from the sharp absorption edge through the visible portion of the spectrum indicates that as grown n-type ZnO is perfect for any optical device applications. P-type ZnO thin films were successfully grown by MOCVD technique on n-type ZnO substrate to form ZnO based p-n junction structure. Cadmium and magnesium doped ZnO films were also grown by MOCVD and resulted in tunable bad gap energy of ZnO based alloy. Ohmic contact layer on n-type ZnO was formed by using Ti/Au and on p-type ZnO was formed by using Ni/Au. The current-voltage (I-V) characteristics of the ZnO based p-n junction exhibited rectification when reverse biased with a breakdown voltage of 10 V and turn-on voltage of 3.3 V. Post anneal of p-type ZnO films showed big improvement on the I-V characteristics. Electroluminescence (EL) spectra obtained from devices driven to 40mA are dominated by a peak at 384nm.

Impact of Manganese incorporation on the structural and magnetic properties of MOCVD-grown Ga 1− x Mn x N

This paper reports the impact of the Mn incorporation on the structural and magnetic properties of Ga1-xMnxN on the metal-organic vapor phase deposition (MOCVD). Crystalline quality and phase purity were determined by high-resolution X-ray diffraction and indicated that no macroscopic second phases are formed during growth. Atomic force microscopy revealed a 2dimensional MOCVD step-flow growth pattern in the Mn-incorporated samples. Various annealing steps were applied to some of the samples to reduce compensating defects and to investigate the effects of post processing on the growth. SQUID measurements showed an apparent ferromagnetic hysteresis behavior. However, none of the requirements for room temperature ferromagnetism in the prevailing mean field DMS theories were found. Therefore, different origins of the ferromagnetic signal are discussed.

Cu Induced Optical Transitions in MOCVD Grown Cu Doped GaN

ion mass spectroscopy (SIMS) and found to vary from 2x10 16 cm -3 to 5x10 17 cm -3 . Raman studies confirmed high crystalline quality of GaN:Cu with no major structural damages due to Cu incorporation. PL investigation revealed that the origin of the emission around 2.4 eV is most likely due to Cu incorporation. The electrical conductivity of the samples was analyzed by Hall measurements and the found semi-insulating behavior was assigned to the compensation of intrinsic donors by the deep Cu acceptor states.

Investigation of molecular co-doping for low ionization energy p-type centers in (Ga,Al)N

This work initiates an investigation of molecular co-doping to produce p-type centers in (Ga,Al)N with ionization energies lower than Mg. Dopant complexes can be formed between a doubly ionized acceptor such as (Cu, Li or Ag) and a singly ionized donor (silicon). Ion implantation of Cu, Li and Ag into silicon doped GaN films grown by Metalorganic Chemical Vapor Deposition (MOCVD) has been performed. Secondary ion mass spectroscopy (SIMS) data confirmed the simulated depth profile. High resolution X-ray diffraction and Raman spectroscopy were used to characterize the crystalline damage and subsequent recovery upon anneal. A complete recovery was observed after high temperature (700-900°C) annealing. Low temperature (6K) photoluminescence (PL) for Cu-implanted GaN showed bands identified with crystalline lattice damage due to the Cu-implantation. The annealed samples showed recovery of standard crystalline GaN features. Additional donor-acceptor pair features are observed below 3.35 eV indicating the existence of an acceptor state.