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Dive into the research topics where Akifumi Mishima is active.

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Featured researches published by Akifumi Mishima.


electronic components and technology conference | 2005

Application of Gold-Tin Solder Paste for Fine Parts and Devices

Masayuki Ishikawa; Hayato Sasaki; Satoko Ogawa; Masayoshi Kohinata; Akifumi Mishima; Hideaki Yoshida

Au-Sn solder paste can be applied by various providing methods, such as printing, dispense, pin transfer, etc.. These methods also make it possible to reduce the production cost. However, in the case of using solder paste, the occurrence of void is one of the most undesirable problems. In this study, we have tried to identify the mechanism of void generation and to reduce voids. We found that the most important factor was to prevent both the gases generated during the reflow process and the generation of Au and/or Sn rich phase in molten Au-Sn solder. For details, it was indicated that for the former it is practical to optimize the pre-heat temperature and holding time in reflow process, to make O2 contents of the powder lower, to control the amount of activator in flux, etc.. For the latter it is important to optimize the composition of the Au-Sn alloy for the reduction of Au and/or Sn rich phases in molten solder.


Archive | 1992

Platinum-cobalt alloy sputtering target and method for manufacturing same

Makoto Kinoshita; Jun Tamura; Masaki Morikawa; Kunio Kishida; Toshinori Ishii; Akifumi Mishima


Archive | 1997

Sputtering target of dielectrics having high strength and a method for manufacturing same

Kazuo Watanabe; Akifumi Mishima


Archive | 2003

Silver alloy sputtering target for forming reflective layer of optical recording medium

Akifumi Mishima


Archive | 2007

Sputtering target for forming high strength optical recording medium protection film

Shoubin Zhang; Hayato Sasaki; Syozou Komiyama; Akifumi Mishima


Archive | 2008

SPUTTERING TARGET FOR FORMING ZRO2-IN2O3 BASED PROTECTIVE FILM FOR OPTICAL STORAGE MEDIUM

Shoubin Zhang; Akifumi Mishima


Archive | 1997

Sputtering target for depositing ferroelectric film, method for preparing the same, and method for preparing a DRAM using the same

Ichirou Shiono; Kazuo Watanabe; Hitoshi Maruyama; Akifumi Mishima; Satoru Mori; Jun-ichi Oda


Archive | 2007

High-strength sputtering target for forming protective film for optical recording medium

Shoubin Zhang; Hayato Sasaki; Shozo Komiyama; Akifumi Mishima


Archive | 2006

HIGH STRENGTH SPUTTERING TARGET FOR FORMING PHOSPHOR FILM IN ELECTROLUMINESCENCE ELEMENT

Shoubin Zhang; Shozo Komiyama; Akifumi Mishima


Archive | 2005

Au-Sn Alloy Bump Having no Trapped-In Large Void and Process for Producing the Same

Masayuki Ishikawa; Masayoshi Kohinata; Akifumi Mishima

Collaboration


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Shoubin Zhang

MITSUBISHI MATERIALS CORPORATION

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Shozo Komiyama

MITSUBISHI MATERIALS CORPORATION

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Kazuo Watanabe

MITSUBISHI MATERIALS CORPORATION

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Hayato Sasaki

MITSUBISHI MATERIALS CORPORATION

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Masayoshi Kohinata

MITSUBISHI MATERIALS CORPORATION

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Masayuki Ishikawa

MITSUBISHI MATERIALS CORPORATION

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Gou Yamaguchi

MITSUBISHI MATERIALS CORPORATION

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Hideaki Yoshida

MITSUBISHI MATERIALS CORPORATION

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Hitoshi Maruyama

MITSUBISHI MATERIALS CORPORATION

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Ichirou Shiono

MITSUBISHI MATERIALS CORPORATION

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