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Featured researches published by Akihiro Aiba.


ASME 2005 Pacific Rim Technical Conference and Exhibition on Integration and Packaging of MEMS, NEMS, and Electronic Systems collocated with the ASME 2005 Heat Transfer Summer Conference | 2005

Novel Cyanide Free Electroless Au Plating for the Reliable Joint Between Ni-P/Au and Sn-Ag-Cu Based Lead Free Solder

Akihiro Aiba; Kazumi Kawamura; Masashi Kumagai

Novel cyanide free electroless Au plating with an excellent bath stability and the reliable joint with solder was developed. Although the Au plating solution was based on sulfurous acid, the solution’s stability turned out to be excellent by the effective complexing force of the novel additives. The bath stood working without any precipitations for more than 3 metal turnovers. Since the displacement reaction between Ni-P and Au took place in the mild and the uniform way by the aid of the additives involved, resulting in the uniform and the fine grain structure of the plated film, almost no pinholes on the Au plating layer and no pitting corrosion in the ground Ni-P layer could be observed. The joint strength between the BGA pad plated with this novel Ni-P/Au plating and Sn-Ag-Cu based lead free solder ball was found to be much higher than that obtained by the conventional cyanide process. The excellent joint reliability of this process was probably due to the fact that the uniform Au layer with almost no pinholes effectively suppressed the oxidation of the Ni-P surface and eventually almost no pitting corrosion was produced in the Ni-P layer without forming any fatal voids.Copyright


Archive | 2006

Plating solution for electroless palladium plating

Akihiro Aiba; Hirofumi Takahashi


Archive | 2006

Electroless palladium plating liquid

Akihiro Aiba; Hirofumi Takahashi


Archive | 2011

Electroless plating pretreatment agent, electroless plating method using same, and electroless plated object

Toru Imori; Jun Suzuki; Ryu Murakami; Akihiro Aiba; Junichi Ito


Archive | 2006

Plated base material

Akihiro Aiba; Kazumi Kawamura; Hirofumi Takahashi


Archive | 2008

Copper Anode or Phosphorous-Containing Copper Anode, Method of Electroplating Copper on Semiconductor Wafer, and Semiconductor Wafer with Low Particle Adhesion

Akihiro Aiba; Hirofumi Takahashi


Archive | 2013

Electrolytic copper plating solution for filling for forming microwiring of copper for ulsi

Junnosuke Sekiguchi; Hirofumi Takahashi; Akihiro Aiba


Archive | 2006

Chemical gold plating liquid

Akihiro Aiba; Kazumi Kawamura


Archive | 2016

SILVER COATING MATERIAL AND METHOD FOR MANUFACTURING SAME

Akihiro Aiba; Hirofumi Takahashi; Takashi Ouchi; Satoru Endo; Ryu Murakami; Satoshi Miyazawa; Masahiko Odashima; Hiroyuki Tokuda


Archive | 2010

Agent de traitement de surface pour cuivre ou alliage de cuivre, et procédé de traitement de surface pour cuivre ou alliage de cuivre

Akihiro Aiba; 相場 玲宏; Hirofumi Takahashi; 祐史 高橋

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