Akiyuki Minami

Alignment marks of semiconductor substrate and manufacturing method thereof

Resist mask for measuring the accuracy of overlaid layers

Method of manufacturing alignment mark

Resist mark having measurement marks for measuring the accuracy of overlay of a photomask disposed on semiconductor wafer and method for manufacturing semiconductor wafer having it

Semiconductor non-volatile memory cell, method of producing the same, semiconductor non-volatile memory having the semiconductor non-volatile memory cell, and method of producing the same

Apparatus and method for exposure

Resist mask having measurement marks for measuring the accuracy of overlay of a photomask disposed on semiconductor wafer

Method for manufacturing semiconductor wafer having resist mask with measurement marks for measuring the accuracy of overlay of a photomask

Method for detecting alignment accuracy

Semiconductor non-volatile memory having semiconductor non-volatile memory cell with electric charge accumulation layer, and method of producing the same