Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Akutsu Toshiaki is active.

Publication


Featured researches published by Akutsu Toshiaki.


Archive | 2006

CMP ABRASIVE AND POLISHING METHOD OF SUBSTRATE

Fukazawa Masato; Koyama Naoyuki; Otsuki Hiroto; Kurata Yasushi; Haga Koji; Akutsu Toshiaki


Archive | 2008

ADDITIVES FOR ABRASIVES, ABRASIVES, METHOD FOR POLISHING SUBSTRATE AND ELECTRONIC COMPONENT

Enomoto Kazuhiro; Akutsu Toshiaki; Nishiyama Masaya; Sato Hidekazu


Archive | 2012

POLISHING AGENT FOR SILICON OXIDE, ADDITIVE LIQUID AND METHOD FOR POLISHING

Nishiyama Masaya; Fukazawa Masato; Akutsu Toshiaki; Enomoto Kazuhiro; Ashizawa Toranosuke; Otsuki Hiroto


Archive | 2012

CMP POLISHING LIQUID, POLISHING METHOD OF SUBSTRATE, AND ELECTRONIC COMPONENT

Shinoda Takashi; Enomoto Kazuhiro; Akutsu Toshiaki


Archive | 2011

CMP polishing liquid and polishing method using the same and fabricating method of semiconductor substrate

Yoshikawa Shigeru; Akutsu Toshiaki; Fukasawa Masato


Archive | 2011

ABRASIVE FOR SILICON OXIDE, LIQUID ADDITIVE AND POLISHING METHOD

Nishiyama Masaya; Fukazawa Masato; Akutsu Toshiaki; Enomoto Kazuhiro; Ashizawa Toranosuke; Otsuki Hiroto


Archive | 2009

ABRASIVE POWDER, POLISHING METHOD OF BASE USING SAME, AND MANUFACTURING METHOD OF ELECTRONIC COMPONENT

Yoshikawa Shigeru; Akutsu Toshiaki; Kimura Tadahiro


Archive | 2008

USE OF A POLISHING AGENT FOR SELECTIVELY POLISHING A SILICON OXIDE FILM ON POLYSILICON

Nishiyama Masaya; Fukasawa Masato; Akutsu Toshiaki; Enomoto Kazuhiro; Ashizawa Toranosuke; Ootsuki Yuuto


Archive | 2005

CMP POLISHING AGENT AND METHOD OF POLISHING SUBSTRATE

Haga Koji; Kurata Yasushi; Akutsu Toshiaki


Archive | 2011

METHOD OF POLISHING SUBSTRATE

Yoshikawa Shigeru; Akutsu Toshiaki; Hosaka Daisuke

Collaboration


Dive into the Akutsu Toshiaki's collaboration.

Researchain Logo
Decentralizing Knowledge