Alberto Eljarrat
University of Barcelona
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Publication
Featured researches published by Alberto Eljarrat.
Ultramicroscopy | 2012
Lluís Yedra; Alberto Eljarrat; Raul Arenal; Eva Pellicer; Moisés Cabo; Alberto López-Ortega; Marta Estrader; Jordi Sort; Maria Dolors Baró; S. Estradé; F. Peiró
Electron tomography is a widely spread technique for recovering the three dimensional (3D) shape of nanostructured materials. Using a spectroscopic signal to achieve a reconstruction adds a fourth chemical dimension to the 3D structure. Up to date, energy filtering of the images in the transmission electron microscope (EFTEM) is the usual spectroscopic method even if most of the information in the spectrum is lost. Unlike EFTEM tomography, the use of electron energy-loss spectroscopy (EELS) spectrum images (SI) for tomographic reconstruction retains all chemical information, and the possibilities of this new approach still remain to be fully exploited. In this article we prove the feasibility of EEL spectroscopic tomography at low voltages (80 kV) and short acquisition times from data acquired using an aberration corrected instrument and data treatment by Multivariate Analysis (MVA), applied to Fe(x)Co((3-x))O(4)@Co(3)O(4) mesoporous materials. This approach provides a new scope into materials; the recovery of full EELS signal in 3D.
Nano Letters | 2016
Pau Torruella; Raul Arenal; Francisco de la Peña; Zineb Saghi; Lluís Yedra; Alberto Eljarrat; Lluís López-Conesa; Marta Estrader; Alberto López-Ortega; German Salazar-Alvarez; Josep Nogués; Caterina Ducati; Paul A. Midgley; F. Peiró; S. Estradé
The physicochemical properties used in numerous advanced nanostructured devices are directly controlled by the oxidation states of their constituents. In this work we combine electron energy-loss spectroscopy, blind source separation, and computed tomography to reconstruct in three dimensions the distribution of Fe(2+) and Fe(3+) ions in a FeO/Fe3O4 core/shell cube-shaped nanoparticle with nanometric resolution. The results highlight the sharpness of the interface between both oxides and provide an average shell thickness, core volume, and average cube edge length measurements in agreement with the magnetic characterization of the sample.
Microscopy and Microanalysis | 2012
Alberto Eljarrat; S. Estradé; Ž. Gačević; Sergio Fernández-Garrido; E. Calleja; C. Magen; F. Peiró
High-resolution monochromated electron energy loss spectroscopy (EELS) at subnanometric spatial resolution and <200 meV energy resolution has been used to assess the valence band properties of a distributed Bragg reflector multilayer heterostructure composed of InAlN lattice matched to GaN. This work thoroughly presents the collection of methods and computational tools put together for this task. Among these are zero-loss-peak subtraction and nonlinear fitting tools, and theoretical modeling of the electron scattering distribution. EELS analysis allows retrieval of a great amount of information: indium concentration in the InAlN layers is monitored through the local plasmon energy position and calculated using a bowing parameter version of Vegard Law. Also a dielectric characterization of the InAlN and GaN layers has been performed through Kramers-Kronig analysis of the Valence-EELS data, allowing band gap energy to be measured and an insight on the polytypism of the GaN layers.
Microscopy and Microanalysis | 2013
Alberto Eljarrat; L. López-Conesa; C. Magen; Gačević Z; Sergio Fernández-Garrido; E. Calleja; S. Estradé; F. Peiró
III-V nitride (AlGa)N distributed Bragg reflector devices are characterized by combined high-angle annular dark-field (HAADF) and electron energy loss spectroscopy (EELS) in the scanning transmission electron microscope. Besides the complete structural characterization of the AlN and GaN layers, the formation of AlGaN transient layers is revealed using Vegard law on profiles of the position of the bulk plasmon peak maximum. This result is confirmed by comparison of experimental and simulated HAADF intensities. In addition, we present an advantageous method for the characterization of nano-feature structures using low-loss EELS spectrum image (EEL-SI) analysis. Information from the materials in the sample is extracted from these EEL-SI at high spatial resolution.The log-ratio formula is used to calculate the relative thickness, related to the electron inelastic mean free path. Fitting of the bulk plasmon is performed using a damped plasmon model (DPM) equation. The maximum of this peak is related to the chemical composition variation using the previous Vegard law analysis. In addition, within the context of the DPM, information regarding the structural properties of the material can be obtained from the lifetime of the oscillation. Three anomalous segregation regions are characterized, revealing formation of metallic Al islands.
Journal of Applied Physics | 2013
Ž. Gačević; Alberto Eljarrat; F. Peiró; E. Calleja
This work gives a detailed insight into how the formation of (Al,Ga)N transient layers (TLs) at the interfaces of AlN/GaN Bragg reflectors modifies their structural and optical properties. While abrupt AlN/GaN interfaces are typically characterized with a network of microcracks, those with TLs are characterized with a network of nanocracks. Transmission electron microscopy reveals a strong correlation between strain and the TLs thickness, identifying thus the strain as the driving force for TLs formation. The AlN/GaN intermixing preserves the targeted stopband position (∼410 nm), whereas the peak reflectivity and the stopband width are both reduced, but still significantly high: >90% and >30 nm, respectively. To model their optical properties, a reduced refractive index contrast approximation is used, a novel method which yields an excellent agreement with the experiment.
Microscopy and Microanalysis | 2017
Francisco de la Peña; Tomas Ostasevicius; Vidar Tonaas Fauske; Pierre Burdet; Petras Jokubauskas; Magnus Nord; Mike Sarahan; Eric Prestat; Duncan N. Johnstone; Joshua A. Taillon; Jan Caron; Tom Furnival; Katherine E. MacArthur; Alberto Eljarrat; Stefano Mazzucco; Vadim Migunov; Thomas Aarholt; Michael Walls; Florian Winkler; Gaël Donval; Ben Martineau; Andreas Garmannslund; Luiz-Fernando Zagonel; Ilya Iyengar
Francisco de la Peña, Tomas Ostasevicius, Vidar Tonaas Fauske, Pierre Burdet, Petras Jokubauskas, Magnus Nord, Mike Sarahan, Eric Prestat, Duncan N. Johnstone, Joshua Taillon, Jan Caron, Tom Furnival, Katherine E. MacArthur, Alberto Eljarrat, Stefano Mazzucco, Vadim Migunov, Thomas Aarholt, Michael Walls, Florian Winkler, Gaël Donval, Ben Martineau, Andreas Garmannslund, Luiz-Fernando Zagonel and Ilya Iyengar
Microscopy and Microanalysis | 2016
Alberto Eljarrat; Xavier Sastre; F. Peiró; S. Estradé
In the present work, the dielectric response of III-nitride semiconductors is studied using density functional theory (DFT) band structure calculations. The aim of this study is to improve our understanding of the features in the low-loss electron energy-loss spectra of ternary alloys, but the results are also relevant to optical and UV spectroscopy results. In addition, the dependence of the most remarkable features with composition is tested, i.e. applying Vegards law to band gap and plasmon energy. For this purpose, three wurtzite ternary alloys, from the combination of binaries AlN, GaN, and InN, were simulated through a wide compositional range (i.e., Al x Ga1-x N, In x Al1-x N, and In x Ga1-x N, with x=[0,1]). For this DFT calculations, the standard tools found in Wien2k software were used. In order to improve the band structure description of these semiconductor compounds, the modified Becke-Johnson exchange-correlation potential was also used. Results from these calculations are presented, including band structure, density of states, and complex dielectric function for the whole compositional range. Larger, closer to experimental values, band gap energies are predicted using the novel potential, when compared with standard generalized gradient approximation. Moreover, a detailed analysis of the collective excitation features in the dielectric response reveals their compositional dependence, which sometimes departs from a linear behavior (bowing). Finally, an advantageous method for measuring the plasmon energy dependence from these calculations is explained.
Nanoscale | 2013
Alberto Eljarrat; Lluís López-Conesa; José Manuel Rebled; Y. Berencén; Joan Manel Ramírez; B. Garrido; C. Magen; S. Estradé; F. Peiró
High resolution scanning transmission electron microscopy with an aberration corrected and monochromated instrument has been used for the assessment of the silicon-based active layer stack for novel optoelectronic devices. This layer contains a multilayer structure consisting of alternate thin layers of pure silica (SiO2) and silicon-rich silicon oxide (SRO, SiOx). Upon high temperature annealing the SRO sublayer segregates into a Si nanocluster (Si-nc) precipitated phase and a SiO2 matrix. Additionally, erbium (Er) ions have been implanted and used as luminescent centres in order to obtain narrow emission at 1.54 μm. Our study exploits the combination of high angle annular dark field (HAADF) imaging with a sub-nanometer electron probe and electron energy loss spectroscopy (EELS) with an energy resolution below 0.2 eV. The structural and chemical information is obtained from the studied multilayer structure. In addition, the instrumental techniques for calibration, deconvolution, fitting and analysis of the EELS spectra are explained in detail. The spatial distribution of the Si-nanoclusters (Si-ncs) and the SiO2 barriers is accurately delimited in the multilayer. Additionally, the quality of the studied multilayer in terms of composition, roughness and defects is analysed and discussed. Er clusterization has not been observed; even so, blue-shifted plasmon and interband transition energies for silica are measured, in the presence of Er ions and sizable nanometer-size effects.
Journal of Physics: Conference Series | 2011
Alberto Eljarrat; Ž. Gačević; Sergio Fernández-Garrido; E. Calleja; C. Magen; S. Estradé; F. Peiró
Ten-period InAlN/GaN distributed Bragg reflectors are examined by aberration corrected scanning transmission electron microscopy and by valence electron energy-loss spectroscopy (VEELS) with sub-nanometric spatial resolution and sub-eV energy dispersion. Deconvolution and peak subtraction methods, implemented in Matlab routines, are applied to the low loss region of the obtained VEEL spectra to retrieve information about the band gap energy and chemical composition, whereas a Kramers-Kronig transformation is used to retrieve the complex dielectric function of the examined material. The VEEL measurements reveal significant compositional variations in InAlN layers and show a ~2nm thick InAlN layer with high indium content at each GaN/InAlN interface.
Applied Physics Letters | 2014
Lluís Yedra; Pau Torruella; Alberto Eljarrat; A. D. Darbal; J. K. Weiss; F. Peiró; S. Estradé
The effects of beam precession on the Electron Energy Loss Spectroscopy (EELS) signal of the carbon K edge in a 2 monolayer graphene sheet are studied. In a previous work, we demonstrated the use of precession to compensate for the channeling-induced reduction of EELS signal when in zone axis. In the case of graphene, no enhancement of EELS signal is found in the usual experimental conditions, as graphene is not thick enough to present channeling effects. Interestingly, though it is found that precession makes it possible to increase the collection angle, and, thus, the overall signal, without a loss of signal-to-background ratio.