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Featured researches published by Albertus Oosenbrug.


lasers and electro optics society meeting | 1996

Power integrity of 980 nm pump lasers at 200 mW and above

Albertus Oosenbrug; Christoph S. Harder; Abram Jakubowicz; Peter Roentgen

More than 50 million device hours have been accumulated to date in field operation of Er/sup 3+/-doped fiber amplifiers (EDFAs) using our single-mode 980-nm semiconductor lasers as pump sources. The reliability of the E2-type pump laser has been reported earlier, and fulfills the requirements posed by terrestrial telecommunications applications, both from wear-out and from sudden-failure rate considerations. Failure analysis results show that most of the device failures are caused by catastrophic rear-mirror damage. This is likely due to the high absorption of the a-Si In the multilayer Al/sub 2/O/sub 3//a-Si stack. To prevent this type of failure mechanism, a rear-mirror stack has been developed in which the absorption has been strongly reduced. In order to test the effect of the reduced back-mirror absorption and the feasibility of operation at 200 mW a large number of E2-type lasers have been subjected to high-current and high-temperature stress tests. The devices used in the experimental work are standard 980 nm E2 lasers, i.e. 750-/spl mu/m long, MBE-grown single-quantum-well AlGaAs/lnGaAs lasers.


lasers and electro-optics society meeting | 1995

Threshold current as acceleration parameter for degradation of 980 nm pump lasers

Albertus Oosenbrug; Christoph S. Harder; Peter Roentgen

To experimentally demonstrate reliability beyond levels achieved previously, as required for applications like submarine, one would like to have higher degradation acceleration than available just from temperature and optical power. In particular, this would also be of importance for lot and technology validation. From earlier stress-test experiments, we have evidence that threshold current could be an additional accelerating factor. In this paper we describe the acceleration of the current-degradation rate observed with laser operation at higher threshold-current (I/sub th/) levels. Higher-I/sub th/ devices have been obtained either through selection within a standard population or through modification of the front-mirror reflectivity. The devices used in the experimental work are standard 980 nm E2 lasers, i.e. 750 /spl mu/m long MBE-grown SQW AlGaInAs lasers with a 4 /spl mu/m wide ridge etched into the top p-cladding.


Archive | 1993

Full-wafer processing of laser diodes with cleaved facets

Theodor Forster; Christoph Dr. Harder; Albertus Oosenbrug; Gary W. Rubloff


Archive | 1991

Method for batch cleaving semiconductor wafers and coating cleaved facets

Ronald F. Broom; Marcel Gasser; Christoph S. Harder; Ernst Eberhard Dr. Latta; Albertus Oosenbrug; Heinz Richard; Peter Vettiger


Archive | 1986

Fabricating a field effect transistor utilizing a dummy gate

Volker Graf; Albertus Oosenbrug


Archive | 1998

Titanium nitride diffusion barrier for use in non-silicon technologies and method

Andreas Daetwyler; Urs Deutsch; Christoph S. Harder; Wilhelm Heuberger; Eberhard Latta; Abram Jakubowicz; Albertus Oosenbrug; William Patrick; Peter Roentgen; Erica Williams


Archive | 1981

METHOD FOR INCREASING THE RESISTANCE OF A SOLID MATERIAL SURFACE AGAINST ETCHING

Kurt Dätwyler; Albertus Oosenbrug


Archive | 1985

PROCESS OF FABRICATING A FULLY SELF- ALIGNED FIELD EFFECT TRANSISTOR

Volker Graf; Albertus Oosenbrug


Archive | 1999

A titanium nitride diffusion barrier for use in non-silicon technologies and metallization method

Andreas Daetwyler; Urs Deutsch; Christoph S. Harder; Wilhelm Heuberger; Eberhard Latta; Abram Jakubowicz; Albertus Oosenbrug; William Patrick; Peter Roentgen; Erica Williams


Archive | 1992

Herstellung von Laserdioden mit durch Spaltung erzeugten Stirnflächen auf einem vollständigen Wafer.

Theodor Forster; Christoph Dr. Harder; Albertus Oosenbrug; Gary W. Rubloff

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