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Publication
Featured researches published by Alex Dommann.
Surface & Coatings Technology | 2001
Anthony J. Perry; S.J. Bull; Alex Dommann; Markus Michler; B.P. Wood; David Rafaja; Jesse N. Matossian
The surface smoothing of TiN coatings, deposited by CVD or PVD methods, by argon ion clusters comprising a few hundred to a few hundred thousand atoms and carrying a single positive charge has been confirmed. In addition, the present work has shown that there was no change in the mechanical condition, nanohardness or residual stress, of the PVD coatings after treatment. In contrast, the nanohardness in the near-surface region of the CVD TiN coating was increased but, remarkably, there was no concomitant increase in residual stress. A comparison is made with the established effects of classical single ion implantation on the near-surface properties of TiN where a high compressive residual stress is developed if the ion energy lies beyond a threshold value. It was concluded that only a fraction of the atoms in the cluster impact the surface and the vast majority of argon atoms move sideways. It appears to be generic that the smaller clusters are responsible for the increase in hardness as well as the well-known lateral sputtering effects associated with the technology. Larger clusters do not carry enough energy per atom to cause such effects and their energy is dissipated in the substrate as heat.
Surface & Coatings Technology | 2000
Anthony J. Perry; S.J. Bull; Alex Dommann; David Rafaja; B.P. Wood; Markus Michler
The surface smoothing of TiN coatings, deposited by CVD or PVD methods, by argon ion clusters comprising some 2000 atoms and carrying only a single positive charge has been confirmed. In addition, the present work has shown that there was no change in the mechanical condition, nanohardness or residual stress, of the PVD coatings. In contrast, the nanohardness in the near-surface region of the CVD TiN coating was increased but, remarkably, there was no concomitant increase in residual stress. A comparison was made with the established effects of ion implantation on the near-surface properties of TiN where a high compressive residual stress is developed if the ion energy lies beyond a threshold value. It was concluded that the vast majority of argon atoms from the clusters move sideways on impacting the sample surface, leading to the well-known lateral sputtering effects associated with the technology, and causing limited surface damage.
Journal of Materials Science: Materials in Medicine | 2006
Wolfram Höland; Volker Rheinberger; Elke Apel; Christian Van 't Hoen; Marlies Höland; Alex Dommann; Marcel Obrecht; Corinna Mauth; Ursula Graf-Hausner
Materials Transactions | 2002
Andreas Kündig; Daniel Lepori; Anthony J. Perry; Sebastian Rossmann; Andreas Blatter; Alex Dommann; Peter J. Uggowitzer
Archive | 2001
Andreas Kündig; William L. Johnson; Alex Dommann
Materials Science and Engineering A-structural Materials Properties Microstructure and Processing | 2004
A.A. Kündig; Alex Dommann; William L. Johnson; Peter Uggowitzer
Archive | 2003
Philippe Steiert; Gerhard Staufert; Alex Dommann; Andreas Kündig; Peter J. Uggowitzer
Materials Science and Engineering A-structural Materials Properties Microstructure and Processing | 2006
Anthony J. Perry; Andreas A. Kündig; Marlies Höland; Alex Dommann
Archive | 2004
Peter Uggowitzer; Alex Dommann; Daniel Rüfenacht; Andreas Kündig; Jörg Löffler
Archive | 2003
Peter J. Uggowitzer; Andreas Blatter; Alex Dommann; Andreas Kündig; Sebastian Rossmann