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Dive into the research topics where Alexander V. Tavrov is active.

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Featured researches published by Alexander V. Tavrov.


Optical Engineering | 2002

Rigorous coupled-wave analysis calculus of submicrometer interference pattern and resolving edge position versus signal-to-noise ratio

Alexander V. Tavrov; Michael Totzeck; Norbert Kerwien; Hans J. Tiziani

The signal-to-noise ratio required to obtain 10-nm accuracy in the measurement of lateral position is studied with an interference microscope. Evaluations are performed using the rigorous coupled-wave analysis (RCWA) modal approach and Hopkins image formation theory.


Optics Letters | 2002

Achromatic nulling interferometer based on a geometric spin-redirection phase

Alexander V. Tavrov; R. Bohr; Michael Totzeck; Hans J. Tiziani; Mitsuo Takeda

Nulling interferometry aims to perform destructive interference achromatically. It is used to detect a faint source near a bright one and to provide dark field, an annular pupil, and rotational shear. A nulling out-of-plane interferometer that utilizes the geometric phase of spin redirection is proposed. The degree of nulling is determined by beam collimation and angular orientation of mirrors. Simulations and experiments are in reasonable agreement.


Applied Optics | 2005

Diffraction-induced coherence levels

Alexander V. Tavrov; Joanna Schmit; Norbert Kerwien; Wolfgang Osten; Hans J. Tiziani

We examined the influence of complex diffraction effects on low-coherence fringes created for high-aspect depth-to-width ratio structures called trenches. The coherence function was analyzed for these micrometer-wide trenches and was registered with a white-light interference microscope. For some types of surface structure we observed that additional low-coherence fringes that do not correspond directly to the surface topology are formed near the sharp edges of the structures. These additional coherence fringes were studied by rigorous numerical evaluations of vector diffractions, and these simulated interference fields were then compared with experimental results that were obtained with a white-light interference microscope.


Optical Measurement Systems for Industrial Inspection III | 2003

Vector simulations of dark beam interaction with nanoscale surface features

Alexander V. Tavrov; Norbert Kerwien; Reinhard Berger; Hans J. Tiziani; Michael Totzeck; Boris Spektor; Josef Shamir; Andrei Brunfeld

In earlier publications, it was shown that scanning of surfaces by dark beams can be exploited for sub-wavelength feature analysis. In this work, we present vector simulations based in Rigorous Coupled-Wave Analysis with the purpose to estimate the expected resolution of the method, both lateral (feature size) and axial (height). The dark beam used in this study has a line singularity generated by a π-phase step positioned in a Gaussian beam. Various combinations of the illumination and detection nuFmerical apertures (from NA=0.2 to NA=0.8) and different surface features were studied. Polarization effects which become significant at high numerical apetures, were considered as an additional source of information for the analysis. In the case of a sub-wavelength feature on an ideal surface, the resolution of the method is limited only by the electronics noise. In particular, under a reasonable assumption of a 105 signal to noise ratio, it is possible to detect a 0.2 nm step.


Optical Measurement Systems for Industrial Inspection III | 2003

Rapid quantitative phase imaging using phase retrieval for optical metrology of phase-shifting masks

Norbert Kerwien; Alexander V. Tavrov; Jochen Kaufmann; Wolfgang Osten; Hans J. Tiziani

The accuracy of a wave front generated by a lithography phase-shifting mask is essential for the performance of a lithography system. The main task of mask inspection is therefore to detect and quantify phase distortions caused by defects on the mask. There are three different classical ways to get the phase information generated by an object: First, interferometric techniques such as Linnik- or Mach-Zehnder-interferometry, second the method of spatial filtering, as is done in quantitative Zernike phase contrast microscopy, and third the use of phase-retrieval. The first two methods need a highly adapted set-up and are difficult to adjust. Phase retrieval, however, just needs a set of intensity images captured under different focus conditions to reconstruct the phase information. Therefore, this method is ideally suited for fast inspection in an industrial environment. We present phase measurements on MoSiN phase masks reconstructed on the basis of the transport of intensity equation. The effect of low-pass filtering inherent in this method is quantitatively investigated by numerical simulations done with our microscope simulation tool MicroSim. By systematic variation of imaging conditions as well as object-parameters we give insight to the applicability and the limits of the method. Comparison to Mach-Zehnder-interferometry allows the evaluation of the method also for partially coherent illumination conditions.


International Symposium on Optical Science and Technology | 2002

Inspection of subwavelength structures and zero-order gratings using polarization interferometry

Michael Totzeck; Alexander V. Tavrov; Norbert Kerwien; Hans J. Tiziani

The low-pass characteristic of the optical imaging limits severely a quantitative measurement of structure-sizes below the optical wavelength and leads to measurement errors. On the other hand, small structures show different optical characteristics for different polarizations. A fact that corresponds to the form-birefringence of microstructures. It is described for zero-order gratings by polarization dependent dielectric constants in the effective medium theory. The birefringence can be measured accurately by use of polarization interferometry where two orthogonal polarizations interfere so that their phase-difference can be determined. To that end an electro-optic modulator is inserted into the optical path of a polarization microscope to provide the well-defined phase steps for an evaluation according to phase-shifting interferometry. From the phase difference we can conclude on the optical path-difference for both polarizations and from this - using the structure thickness - on the birefringence. Waveguide-models are applied for image interpretation. For an estimation of the width of the structure we compare polarization-interferometrical measurements with rigorous numerical simulations.


International Conference on Space Optics 2014 | 2017

Space telescopes planetary monitoring (PM) and Zvezdny (eng. star) patrol (ZP) for planetary science and exoplanets exploration

Alexander V. Tavrov; Oleg Korablev; Nikolai Vedenkin; Pavel Frolov; Sergey I. Barabanov; Bruno Cugny; Zoran Sodnik; Nikos Karafolas

Solar System planetology requires a wide use of observing spectroscopy for surface geology to atmosphere climatology. A high-contrast imaging is required to study and to characterize extra-solar planetary systems among other faint astronomical targets observed in the vicinity of bright objects. Two middle class space telescopes projects aimed to observe Solar system planets by a long term monitoring via spectroscopy and polarimetry. Extra solar planets (exoplanets) engineering and scientific explorations are included in science program.


Frontiers in Optics | 2003

Coherence effects in narrow trench measurements using white light interferometry

Joanna Schmit; Paul Unruh; Alexander V. Tavrov; Norbert Kerwien; Wolfgang Osten; Hans J. Tiziani

White light interferometry (WLI)1 and optical coherence tomography (OCT) for micro-roughness and profile measurements are both based on the principle of low coherence peak sensing. Additional coherence peaks not corresponding to the surface topology exist due to diffraction from narrow structures; these additional coherence levels must be properly interpreted by WLI and OCT algorithms. We observed additional coherence peaks for a silicon surface with etched trenches only a few microns wide and investigated the amplitude variation of the coherence peaks versus the trench width and depth. Effects from changes in the optical system such as the numerical aperture (NA), magnification, polarization and wavelength spectra were also studied. For example, for an objective with a given numerical aperture the amplitude of the additional coherence level increases with the decreasing trench width. The amplitude of the fringes at the bottom of trench decreases making the amplitude of the fringes representing the real surface much weaker than the additional coherence levels created from strong complex diffraction effects. The experimental data obtained with optical profiler NT 8000 was compared with simulated results obtained from rigorous coupled-wave analysis2 (RCWA) and Hopkins image-formation theory that traces different polarization components in the diffraction image. We have found very good agreement between experimental and simulation results for the case of circular polarization and object structure in the form of a trench 5 microns wide and about 20 microns deep. The additional coherence level can be a problem in i.e. MEMS measurement if not interpreted correctly.


International Symposium on Optical Science and Technology | 2002

Quantitative Zernike phase-contrast microscopy by use of structured birefringent pupil-filters and phase-shift evaluation

Michael Totzeck; Norbert Kerwien; Alexander V. Tavrov; Eva Rosenthal; Hans J. Tiziani


Archive | 2002

Achromatic nulling interferometer by means of geometric spin-redirection phase

Alexander V. Tavrov; R. Bohr; M. Tatzeck; Hans J. Tiziani; Mitsuo Wada Takeda

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Jun Nishikawa

Graduate University for Advanced Studies

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Kaito Yokochi

Tokyo University of Agriculture and Technology

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Mitsuo Takeda

Tokyo University of Agriculture and Technology

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