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Dive into the research topics where Alexandre Fiori is active.

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Featured researches published by Alexandre Fiori.


Applied Physics Letters | 2014

Zr/oxidized diamond interface for high power Schottky diodes

Aboulaye Traore; P. Muret; Alexandre Fiori; David Eon; E. Gheeraert; Julien Pernot

High forward current density of 103 A/cm2 (at 6 V) and a breakdown field larger than 7.7 MV/cm for diamond diodes with a pseudo-vertical architecture, are demonstrated. The power figure of merit is above 244 MW/cm2 and the relative standard deviation of the reverse current density over 83 diodes is 10% with a mean value of 10−9 A/cm2. These results are obtained with zirconium as Schottky contacts on the oxygenated (100) oriented surface of a stack comprising an optimized lightly boron doped diamond layer on a heavily boron doped one, epitaxially grown on a Ib substrate. The origin of such performances are discussed.


Applied Physics Letters | 2012

Hole transport in boron delta-doped diamond structures

Gauthier Chicot; Thu Nhi Tran Thi; Alexandre Fiori; François Jomard; E. Gheeraert; E. Bustarret; Julien Pernot

The temperature dependence of the hole sheet density and mobility of four capped delta boron doped [100]-oriented epilayers has been investigated experimentally and theoretically over a large temperature range (6 K<T<500 K). The influence of the parallel conduction through the thick buffer layer overgrown on the diamond substrate was shown not to be negligible near room temperature. This could lead to erroneous estimates of the hole mobility in the delta layer. None of the delta-layers studied showed any quantum confinement enhancement of the mobility, even the one which was thinner than 2 nm.


Applied Physics Letters | 2014

Critical boron-doping levels for generation of dislocations in synthetic diamond

M. P. Alegre; D. Araújo; Alexandre Fiori; Jose Carlos Piñero; F. Lloret; M.P. Villar; P. Achatz; Gauthier Chicot; E. Bustarret; François Jomard

Defects induced by boron doping in diamond layers were studied by transmission electron microscopy. The existence of a critical boron doping level above which defects are generated is reported. This level is found to be dependent on the CH4/H2 molar ratios and on growth directions. The critical boron concentration lied in the 6.5–17.0 × 1020at/cm3 range in the ⟨111⟩ direction and at 3.2 × 1021 at/cm3 for the ⟨001⟩ one. Strain related effects induced by the doping are shown not to be responsible. From the location of dislocations and their Burger vectors, a model is proposed, together with their generation mechanism.


Journal of Applied Physics | 2014

Electronic and physico-chemical properties of nanometric boron delta-doped diamond structures

G. Chicot; Alexandre Fiori; P. N. Volpe; T. N. Tran Thi; J.-C. Gerbedoen; Jessica Bousquet; M. P. Alegre; J. C. Piñero; D. Araújo; François Jomard; A. Soltani; J.C. De Jaeger; J. Morse; J. Härtwig; N. Tranchant; C. Mer-Calfati; J. C. Arnault; J. Delahaye; T. Grenet; David Eon; F. Omnès; Julien Pernot; E. Bustarret

Heavily boron doped diamond epilayers with thicknesses ranging from 40 to less than 2 nm and buried between nominally undoped thicker layers have been grown in two different reactors. Two types of [100]-oriented single crystal diamond substrates were used after being characterized by X-ray white beam topography. The chemical composition and thickness of these so-called delta-doped structures have been studied by secondary ion mass spectrometry, transmission electron microscopy, and spectroscopic ellipsometry. Temperature-dependent Hall effect and four probe resistivity measurements have been performed on mesa-patterned Hall bars. The temperature dependence of the hole sheet carrier density and mobility has been investigated over a broad temperature range (6 K < T < 450 K). Depending on the sample, metallic or non-metallic behavior was observed. A hopping conduction mechanism with an anomalous hopping exponent was detected in the non-metallic samples. All metallic delta-doped layers exhibited the same mobility value, around 3.6 ± 0.8 cm2/Vs, independently of the layer thickness and the substrate type. Comparison with previously published data and theoretical calculations showed that scattering by ionized impurities explained only partially this low common value. None of the delta-layers showed any sign of confinement-induced mobility enhancement, even for thicknesses lower than 2 nm.


Applied Physics Express | 2013

Synchronized B and 13C Diamond Delta Structures for an Ultimate In-Depth Chemical Characterization

Alexandre Fiori; François Jomard; Tokuyuki Teraji; Satoshi Koizumi; Junichi Isoya; E. Gheeraert; E. Bustarret

The nanometer-range depth resolution of secondary ion mass spectrometry (SIMS) profiles in diamond was achieved by the determination of the depth resolution function (DRF). The measurement of this DRF was performed thanks to isotopic-enriched diamond delta structures composed of 12C and 13C. The artificial SIMS broadening observed on the 13C depth profiles of buried doped diamond epilayers was eliminated and replaced by a boxlike 13C depth profile. Applied to boron delta-doped diamond structures, this analysis has resolved edge widths close to 0.3 nm/dec, as compared with 1.5 nm/decade on the raw SIMS data. Copyright 2013 The Japan Society of Applied Physics


Applied Physics Letters | 2013

Boron concentration profiling by high angle annular dark field-scanning transmission electron microscopy in homoepitaxial δ-doped diamond layers

D. Araújo; M. P. Alegre; Jose Carlos Piñero; Alexandre Fiori; E. Bustarret; François Jomard

To develop further diamond related devices, the concentration and spatial location of dopants should be controlled down to the nanometer scale. Scanning transmission electron microscopy using the high angle annular dark field mode is shown to be sensitive to boron doping in diamond epilayers. An analytical procedure is described, whereby local boron concentrations above 1020 cm−3 were quantitatively derived down to nanometer resolution from the signal dependence on thickness and boron content. Experimental boron local doping profiles measured on diamond p−/p++/p− multilayers are compared to macroscopic profiles obtained by secondary ion mass spectrometry, avoiding reported artefacts.


Applied Physics Letters | 2016

Stratigraphy of a diamond epitaxial three-dimensional overgrowth using doping superlattices

F. Lloret; Alexandre Fiori; D. Araújo; David Eon; M.P. Villar; E. Bustarret

The selective doped overgrowth of 3D mesa patterns and trenches has become an essential fabrication step of advanced monolithic diamond-based power devices. The methodology here proposed combines the overgrowth of plasma-etched cylindrical mesa structures with the sequential growth of dopingsuperlattices. The latter involve thin heavily borondoped epilayers separating thicker undoped epilayers in a periodic fashion. Besides the classical shape analysis under the scanning electron microscope relying on the appearance of facets corresponding to the main crystallographic directions and their evolution toward slow growing facets, the dopingsuperlattices were used as markers in oriented cross-sectional lamellas prepared by focused ion beam and observed by transmission electron microscopy. This stratigraphic approach is shown here to be applicable to overgrown structures where faceting was not detectable. Intermediate growth directions were detected at different times of the growth process and the periodicity of the superlattice allowed to calculate the growth rates and parameters, providing an original insight into the planarization mechanism. Different configurations of the growth front were obtained for different sample orientations, illustrating the anisotropy of the 3D growth.Dislocations were also observed along the lateral growth fronts with two types of Burger vector:b011¯=12[011¯] and b112=16[112]. Moreover, the clustering of these extended defects in specific regions of the overgrowth prompted a proposal of two different dislocation generation mechanisms.


Applied Physics Letters | 2014

Boron-doped superlattices and Bragg mirrors in diamond

Alexandre Fiori; Jessica Bousquet; David Eon; Franck Omnès; E Bellet-Amalric; E. Bustarret

A periodic modulation of the boron doping level of single crystal diamond multilayers over more than three orders of magnitude during epitaxial growth by microwave plasma-enhanced chemical vapor deposition is shown to yield Bragg mirrors in the visible. The thicknesses and doping level of the individual layers were controlled by in situ spectroscopic ellipsometry, enabling to tune the reflectance peak to the wavelength range of diamond color centers, such as NV0 or NV−. The crystalline quality, periodicity, and sharpness of the doping transitions in these doping superlattices over tens of periods were confirmed by high resolution X-ray diffraction.


Applied Physics Letters | 2014

Diamond Schottky diodes with ideality factors close to 1

Alexandre Fiori; Tokuyuki Teraji; Yasuo Koide

The stabilization by vacuum annealing of tungsten carbide/p-diamond Schottky barrier diodes (SBDs) has been investigated. The Schottky barrier height (ϕB) and ideality factor (n), at high temperature, were consistently estimated by employing a vertical SBD structure. An exponential drop of ϕB in time at 600 K and its stabilization at 1.46 eV after 90 min were reported. The lowest n among SBDs examined was close to 1.0 at 600 K. A linear relation between ϕB and n in a statistical electrical characterization suggests a ϕB inhomogeneity.


Journal of Applied Physics | 2017

Mechanism of reverse current increase of vertical-type diamond Schottky diodes

Tokuyuki Teraji; Alexandre Fiori; N. Kiritani; S. Tanimoto; E. Gheeraert; Yasuo Koide

Current transport at p-diamond Schottky contacts under reverse bias operation was investigated. Reverse current transport modes of several types were observed depending on the bias voltage range: thermionic emission (TE) associated with the image force barrier lowering was dominant in the lower voltage range of 1 MV cm−1, which indic...

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E. Bustarret

Centre national de la recherche scientifique

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E. Gheeraert

Centre national de la recherche scientifique

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Tokuyuki Teraji

National Institute for Materials Science

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Julien Pernot

Centre national de la recherche scientifique

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David Eon

Centre national de la recherche scientifique

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François Jomard

Centre national de la recherche scientifique

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Franck Omnès

Joseph Fourier University

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Gauthier Chicot

Joseph Fourier University

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Aboulaye Traore

Centre national de la recherche scientifique

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