Alexandre Gatto

High-performance deep-ultraviolet optics for free-electron lasers

Working with wavelengths shorter than the deep ultraviolet involves the development of dedicated optics for free-electron lasers with devoted coating techniques and characterizations. High-performance deep-ultraviolet optics are specially developed to create low-loss, high-reflectivity dielectric mirrors with long lifetimes in harsh synchrotron radiation environments. In February 2001, lasing at 189.7 nm, the shortest wavelength obtained so far with free-electron-laser oscillators, was obtained at the European Free-electron-laser project at ELETTRA Synchrotron Light Laboratory, Trieste, Italy. In July 2001, 330-mW extracted power at 250 nm was measured with optimized transmission mirrors. Research and development of coatings correlated to lasing performance are reported.

The UV European FEL at ELETTRA: towards compatibility of storage ring operation for FEL and synchrotron radiation

Abstract The European Free Electron Laser (FEL) at ELETTRA has recently increased its maximum operating energy up to 1.5 GeV , the highest electron-beam energy used so far for an FEL. This is an important improvement in the performance of the source, increasing the extracted power at wavelengths around 200 nm and providing better beam stability and lifetime. Furthermore, this development represents a first step towards the solution of a crucial issue—the compatibility of FEL and normal synchrotron radiation operation at a user facility like ELETTRA. In this paper we discuss the most important aspects of this issue; in particular, we show that the properties of the electron beam in FEL mode can match the needs of normal synchrotron radiation experiments that require a few bunch filling of the storage ring.

Optics developments in the VUV—soft X-ray spectral region

The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the search for technological innovations and improvements. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. This paper covers some theoretical considerations, material aspects, design and different techniques of controlled fabrication of multilayer coated optics. Their potential applications for microlithography as well as alternative application fields like microscopy, spectroscopy, soft X-ray lasers and free electron lasers are also discussed.

Highly reflecting aluminum-protected optical coatings for the vacuum-ultraviolet spectral range

We discuss the approaches to preserve the high-reflectance aluminum mirror for the vacuum-ultraviolet spectral region. Single fluoride and oxide layers, a homogeneous multilayer, and hybrid multilayer solutions are put forward. Single fluoride and oxide materials have achieved reflectance above 90% at 193 nm. Multilayer capping can provide reflectance of 93.4% at 193 nm, and a hybrid multilayer of fluoride and oxide can achieve reflectance above 90% to 160 nm.

High-performance coatings for micromechanical mirrors

High-performance coatings for micromechanical mirrors were developed. The high-reflective metal systems can be integrated into the technology of MOEMS, such as spatial light modulators and microscanning mirrors from the near-infrared down to the vacuum-ultraviolet spectral regions. The reported metal designs permit high optical performances to be merged with suitable mechanical properties and fitting complementary metal-oxide semiconductor compatibility.

Flexible mask illumination setup for serial multipatterning in Talbot lithography

A flexible illumination system for Talbot lithography is presented, in which the Talbot mask is illuminated by discrete but variable incidence angles. Changing the illumination angle stepwise in combination with different exposure doses for different angles offers the possibility to generate periodic continuous surface relief structures. To demonstrate the capability of this approach, two exemplary micro-optical structures were manufactured. The first example is a blazed grating with a stepsize of 1.5 μm. The second element is a specific beam splitter with parabolic-shaped grating grooves. The quality of the manufacturing process is evaluated on the basis of the optical performance of the resulting micro-optical elements.

Radiation resistance of single and multilayer coatings against synchrotron radiation

Optical coatings for the use in free electron laser systems have to withstand high power laser radiation and the intense energetic background radiation of the synchrotron radiation source. In general, the bombardment with high energetic photons leads to irreversible changes and a discoloration of the specimen. For the development of appropriate optical coatings, the degradation mechanisms of available optical materials have to be characterized. In this contribution the degradation mechanisms of single layer coatings (fluoride and oxide materials) and multilayer systems will be presented. Fluoride and oxide single layers were produced by thermal evaporation and high energetic ion beam sputter deposition. The same methods were employed for the deposition of multilayer systems. High reflecting coatings for the wavelength region around 180 nm were chosen for the irradiation tests. All samples were characterized after production by spectrophotometry covering the VUV , VIS, and MIR spectral range. Mechanical coating stress was evaluated with interferometric methods. Synchrotron irradiation tests were performed at ELETTRA, using a standardized irradiation cycle for all tests. Ambient pressure and possible contamination in the vacuum environment were monitored by mass spectrometry. For comparison, the optical coatings were investigated again in the VUV, VIS, and MIR spectral range after irradiation. On selected samples XRD measurements were performed. The observed degradation mechanisms comprise severe damages like coating and substrate surface ablation. Color centre formation in the VIS spectral range and an increase of VUV absorption were found as a major origin for a severe degradation of VUV transmittance On the basis of the performed investigations, a selection of coating materials and coating systems is possible in respect to the damage effects caused by synchrotron radiation.

Fabrication of low straylight holographic gratings for space applications

The main challenges of fabricating diffraction gratings for use in earth monitoring spectrometers are given by the requirements for low stray light, high diffraction efficiency and a low polarization sensitivity. Furthermore the use in space also requires a high environmental stability of these gratings. We found that holography in combination with ion beam plasma etching provides a way to obtain monolithic, robust fused silica gratings which are able to meet the above mentioned requirements for space applications. Holography accompanied by plasma etching allows the fabrication of a wide range of different grating profiles to optimize the efficiency including the polarization behavior according to a wealth of applications. Typical profile shapes feasible are blazed gratings, sinusoidal profiles and binary profiles and this allows to tailor the efficiency and polarization requirements exactly to the spectral range of the special application. Holographic gratings can be fabricated on plane and also on curved substrates as core components of imaging spectrometers. In this paper we present our grating fabrication flow for the example of plane blazed gratings and we relate the efficiency and stray light measurement results to certain steps of the process. The holographic setup was optimized to minimize stray light and ghosting recorded by the photoresist during the exposure. Low wave front deviations require the use of highly accurate grating substrates and high precision optics in the holographic exposure.

Storage ring free-electron lasing at 176 nm--dielectric mirror development for vacuum ultraviolet free-electron lasers

Mirrors for storage ring free-electron lasers in the vacuum ultraviolet must provide adequate reflectivity and resistance against synchrotron radiation. The free-electron laser system at ELETTRA (Trieste, Italy) is targeted to lase in the spectral range between 155 and 200 nm. It was demonstrated that dense oxide multilayer coatings allow lasing down to 189.9 nm. However, pure oxide systems show significant absorption at lower wavelengths and cannot be employed below 189.9 nm. Fluoride stacks can be deposited down to 130 nm with high reflection values above 95%, but their resistance against the harsh synchrotron environment is poor. They rapidly degrade; lasing cannot be realized with this mirror approach. For the range between 170 and 190 nm, hybrid systems--combining fluoride and oxide materials--have been manufactured. With appropriate deposition procedures, mirrors achieve reflectance values up to 99% and an adequate radiation resistance simultaneously. A mirror based on a conventional fluoride stack protected by a dense silicon dioxide protection layer was deposited and successfully employed for free-electron lasing at 176.4 nm.

Highly reflective optical coatings for high-power applications of micro scanning mirrors in the UV-VIS-NIR spectral region

This paper addresses different highly reflective optical coatings on micro scanning mirrors (MSM) for applications in the NIR-VIS-UV- spectral region to enable new applications at high optical power density like laser marking and material treatment. In the common case of MSM with an unprotected Al coating, the absorption limits the maximal power density because of induced heating. In contrast to macroscopic optics HR-micro mirror coatings have to guarantee additional demands like low-stress and CMOS compatibility. Hence, to enable novel high power applications of MSM in the NIR-VIS-UV spectral region highly reflective low-stress coatings have been developed according to a triple strategy: (a) broadband metallic reflectors, (b) dielectric multilayers and (c) enhanced hybrid coatings. For Au and Ag based NIR-coatings an excellent mirror planarity and a reflectance around 99 % (@ 1064 nm) have been achieved, whereas dielectric coatings reached 99.7 % for a (LH)4 design and thinner low-stress hybrid NIR-coatings reached up to 99.8 % enabling an improved mirror planarity and excellent laser damage threshold. For the VIS and UV spectral region enhanced hybrid HR-coatings have been favored, because they enable high reflectance of up to 99.7 % @ 633 nm or 98.8 % @ 308 nm in combination with low stress, high mirror planarity and CMOS compatibility.