Andreas K. Kostopoulos

Use of Supramolecular Assemblies as Lithographic Resists

A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.

An Extensive Family of Heterometallic Titanium(IV)–Metal(III) Rings with Structure Control through Templates

A family of heterometallic [Cat][Tix MO(x+1 )(O2 Ct Bu)2x+2 ] rings is reported where Cat=a secondary or tertiary alkyl ammonium ion, x=7, 8 or 9, and M=FeIII , GaIII , CrIII , InIII and AlIII . The structures are regular polygons with eight, nine or ten vertices with each edge bridged by an oxide and two pivalates. The size of the ring formed is controlled by the alkylammonium cation present. In each case a homometallic by-product is found [Cat][Tix O(x+1 )(O2 Ct Bu)2x-1 ].

Hybrid organic-inorganic rotaxanes, including a hetero-hybrid [3]rotaxane featuring two distinct heterometallic rings and a molecular shuttle

[2] and [3] hybrid rotaxanes are reported based on {Ti7 M} rings (M is a trivalent metal such as FeIII or GaIII ). NMR studies show that [2]rotaxanes can act as molecular shuttles, while EPR studies of [3]rotaxanes show weak interactions between the paramagnetic components of the supramolecular assemblies.

CCDC 1519452: Experimental Crystal Structure Determination

Related Article: Andrey V. Gavrikov, Pavel S. Koroteev, Nikolay N. Efimov, Zhanna V. Dobrokhotova, Andrey B. Ilyukhin, Andreas K. Kostopoulos, Ana-Maria Ariciu, Vladimir M. Novotortsev|2017|Dalton Trans.|46|3369|doi:10.1039/C6DT04895A