Andreas Voitsch
Schott AG
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Featured researches published by Andreas Voitsch.
Optical Metrology in Production Engineering | 2004
Christian Mühlig; Siegfried Kufert; Wolfgang Triebel; Frank Coriand; Lutz Parthier; Andreas Voitsch
The laser induced deflection technique (LID) is introduced for measuring small absorption coefficients of highly transparent DUV/VUV optical materials with high sensitivity and accuracy. The measuring principle, the calibration and the developed experimental realization are explained. At 193 nm in situ absorption and fluorescence measurements of fused silica give evidence that a commonly observed absorption decrease at the onset of laser irradiation is a bulk effect and due to a diminution of oxygen deficient centers ODC II. This decline is caused by a single photon absorption process and terminates after a dose of 4-5 kJ/cm2. Fluence dependent bulk absorption measurements of fused silica are presented which indicate the presence of a nonlinear dependence between the absorption coefficient α and the fluence H. For calcium fluoride a very good agreement between direct absorption and conventional transmission measurements is obtained. At 157 nm, a modified compact experimental setup is introduced which exhibits a significantly higher sensitivity than that applied for 193 nm experiments. First measurements of high quality calcium fluoride show that the obtained absorption is independent on the laser repetition rate. The investigation of equivalent CaF2 samples of different thickness (10 mm and 20 mm) indicates that the measured absorption coefficient is virtually free of contributions from the irradiated surfaces. Finally, a very good agreement is obtained by comparing LID data with transmission measurements of 100 mm long samples.
International Symposium on Optical Science and Technology | 2000
Wolfgang Triebel; Sylvia Bark-Zollmann; Christian Muehlig; Andreas Voitsch; Frank Coriand; Jochen Alkemper
Excimer laser pulses ((lambda) equals 193 nm, (lambda) equals 248 nm) induce transient and permanent defects in highly UV transparent optical glass for microlithography. Usually laser damage of fused silica is evaluated by time consuming and expensive marathon tests characterized by about 109 pulses at repetition rates of 400-1000 Hz and fluences of 0.5-10 mJ/cm2. Alternatively, short time tests using high laser energy densities have been developed to quickly evaluate influences of changes in the production technology. The following evaluation methods are used: Laser induced absorption at 193 nm measured by laser induced deflection (LID), Laser induced fluorescence at 650 nm (LIF) excited by 193 nm or 248 nm laser irradiation, H2 content measurement by means of a pulsed Raman spectroscopy at 248 nm laser excitation. Both, the LIF signal and the H2 concentration are measured locally resolved in a non-destructive way. The applied energy densities of the above methods vary from 1 mJ/cm2 to 600 mJ/cm2. The front face technique for investigating large diameter samples, e.g. mask blanks (6 inches and 9 inches), have been established.
Archive | 1998
Frank Coriand; Andreas Menzel; Andreas Voitsch
Archive | 1992
Frank Coriand; Wolfgang Mueller; Andreas Voitsch
Archive | 2000
Hartmut Bauch; Hraban Hack; Frank Rudiger; Thomas Schindelbeck; Rolf Martin; Andreas Menzel; Matthias Schmidt; Roland Scholz; Andreas Voitsch
Archive | 1998
Frank Coriand; Andreas Menzel; Andreas Voitsch
Archive | 2002
Frank Coriand; Andreas Menzel; Andreas Voitsch
Archive | 2000
Marten Walther; Jochen Alkemper; Andreas Menzel; Andreas Voitsch; Thomas Schindelbeck; Hraban Hack
Archive | 2010
Sven Anders; Andreas Menzel; Thomas Schmiady; Schmidt Matthias; Andreas Voitsch
Archive | 2007
Frank Coriand; Andreas Menzel; Andreas Voitsch; コリアント,フランク; フォイチュ,アンドレアス; メンツェル,アンドレアス