Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Andreas Voitsch is active.

Publication


Featured researches published by Andreas Voitsch.


Optical Metrology in Production Engineering | 2004

Bulk absorption measurements of highly transparent DUV/VUV optical materials

Christian Mühlig; Siegfried Kufert; Wolfgang Triebel; Frank Coriand; Lutz Parthier; Andreas Voitsch

The laser induced deflection technique (LID) is introduced for measuring small absorption coefficients of highly transparent DUV/VUV optical materials with high sensitivity and accuracy. The measuring principle, the calibration and the developed experimental realization are explained. At 193 nm in situ absorption and fluorescence measurements of fused silica give evidence that a commonly observed absorption decrease at the onset of laser irradiation is a bulk effect and due to a diminution of oxygen deficient centers ODC II. This decline is caused by a single photon absorption process and terminates after a dose of 4-5 kJ/cm2. Fluence dependent bulk absorption measurements of fused silica are presented which indicate the presence of a nonlinear dependence between the absorption coefficient α and the fluence H. For calcium fluoride a very good agreement between direct absorption and conventional transmission measurements is obtained. At 157 nm, a modified compact experimental setup is introduced which exhibits a significantly higher sensitivity than that applied for 193 nm experiments. First measurements of high quality calcium fluoride show that the obtained absorption is independent on the laser repetition rate. The investigation of equivalent CaF2 samples of different thickness (10 mm and 20 mm) indicates that the measured absorption coefficient is virtually free of contributions from the irradiated surfaces. Finally, a very good agreement is obtained by comparing LID data with transmission measurements of 100 mm long samples.


International Symposium on Optical Science and Technology | 2000

Evaluation of fused silica for DUV laser application by short-time diagnostics

Wolfgang Triebel; Sylvia Bark-Zollmann; Christian Muehlig; Andreas Voitsch; Frank Coriand; Jochen Alkemper

Excimer laser pulses ((lambda) equals 193 nm, (lambda) equals 248 nm) induce transient and permanent defects in highly UV transparent optical glass for microlithography. Usually laser damage of fused silica is evaluated by time consuming and expensive marathon tests characterized by about 109 pulses at repetition rates of 400-1000 Hz and fluences of 0.5-10 mJ/cm2. Alternatively, short time tests using high laser energy densities have been developed to quickly evaluate influences of changes in the production technology. The following evaluation methods are used: Laser induced absorption at 193 nm measured by laser induced deflection (LID), Laser induced fluorescence at 650 nm (LIF) excited by 193 nm or 248 nm laser irradiation, H2 content measurement by means of a pulsed Raman spectroscopy at 248 nm laser excitation. Both, the LIF signal and the H2 concentration are measured locally resolved in a non-destructive way. The applied energy densities of the above methods vary from 1 mJ/cm2 to 600 mJ/cm2. The front face technique for investigating large diameter samples, e.g. mask blanks (6 inches and 9 inches), have been established.


Archive | 1998

Synthetic quartz glass preform and device for the production thereof

Frank Coriand; Andreas Menzel; Andreas Voitsch


Archive | 1992

Optical blank mfr. - using pulsed light beam bundle in opto=electronic system to maintain constant gap between burner and deposition surface

Frank Coriand; Wolfgang Mueller; Andreas Voitsch


Archive | 2000

Device for generating an optically homogeneous, streak-free quartz glass body having a large diameter

Hartmut Bauch; Hraban Hack; Frank Rudiger; Thomas Schindelbeck; Rolf Martin; Andreas Menzel; Matthias Schmidt; Roland Scholz; Andreas Voitsch


Archive | 1998

Synthetic quartz glass preform

Frank Coriand; Andreas Menzel; Andreas Voitsch


Archive | 2002

Apparatus for producing synthetic quartz glass

Frank Coriand; Andreas Menzel; Andreas Voitsch


Archive | 2000

Production of photomask substrates, used for semiconductor lithography, comprises plasma-promoted deposition of quartz glass from reaction gases, doping quartz glass with hydrogen, and processing into photomask substrate plates

Marten Walther; Jochen Alkemper; Andreas Menzel; Andreas Voitsch; Thomas Schindelbeck; Hraban Hack


Archive | 2010

Reprocessing saw liquid used in preparing silicon wafers comprises sawing silicon ingots by wire separation honing-lapping and/or wire abrasive cuttings, suspending silicon abrasive particles and separating the abrasives by sedimentation

Sven Anders; Andreas Menzel; Thomas Schmiady; Schmidt Matthias; Andreas Voitsch


Archive | 2007

Synthetic quartz glass-made preform

Frank Coriand; Andreas Menzel; Andreas Voitsch; コリアント,フランク; フォイチュ,アンドレアス; メンツェル,アンドレアス

Collaboration


Dive into the Andreas Voitsch's collaboration.

Researchain Logo
Decentralizing Knowledge