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Dive into the research topics where Andrew S. Cavanagh is active.

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Featured researches published by Andrew S. Cavanagh.


Advanced Materials | 2010

Ultrathin Direct Atomic Layer Deposition on Composite Electrodes for Highly Durable and Safe Li‐Ion Batteries

Yoon Seok Jung; Andrew S. Cavanagh; Leah A. Riley; Sun-Ho Kang; Anne C. Dillon; Markus D. Groner; Steven M. George; Se-Hee Lee

Abstract : In order to employ Li-ion batteries (LIBs) in next-generation hybrid electric and/or plug-in hybrid electric vehicles (HEVs and PHEVs), LIBs must satisfy many requirements: electrodes with long lifetimes (fabricated from inexpensive environmentally benign materials), stability over a wide temperature range, high energy density, and high rate capability. Establishing long-term durability while operating at realistic temperatures (5000 charge-depleting cycles, 15 year calendar life, and a range from -46 deg C to +66 deg C) for a battery that does not fail catastrophically remains a significant challenge. Recently, surface modifications of electrode materials have been explored as viable paths to improve the performance of LIBs for vehicular applications. Here we clearly demonstrate that conformal ultrathin protective coating by inactive metal oxide without disrupting inter-particle electronic pathway can be realized by atomic layer deposition (ALD) directly performed on a composite electrode, which leads to significant improvement of both long-term durability and safety of NG anode. Also ALD coatings are significantly more promising than efforts that have been previously reported.


Nano Letters | 2011

Ultrathin coatings on nano-LiCoO2 for Li-ion vehicular applications.

Isaac D. Scott; Yoon Seok Jung; Andrew S. Cavanagh; Yanfa Yan; Anne C. Dillon; Steven M. George; Se-Hee Lee

To deploy Li-ion batteries in next-generation vehicles, it is essential to develop electrodes with durability, high energy density, and high power. Here we report a breakthrough in controlled full-electrode nanoscale coatings that enables nanosized materials to cycle with durable high energy and remarkable rate performance. The nanoparticle electrodes are coated with Al(2)O(3) using atomic layer deposition (ALD). The coated nano-LiCoO(2) electrodes with 2 ALD cycles deliver a discharge capacity of 133 mAh/g with currents of 1400 mA/g (7.8C), corresponding to a 250% improvement in reversible capacity compared to bare nanoparticles (br-nLCO), when cycled at this high rate. The simple ALD process is broadly applicable and provides new opportunities for the battery industry to design other novel nanostructured electrodes that are highly durable even while cycling at high rate.


Journal of The Electrochemical Society | 2010

Enhanced Stability of LiCoO2 Cathodes in Lithium-Ion Batteries Using Surface Modification by Atomic Layer Deposition

Yoon Seok Jung; Andrew S. Cavanagh; Anne C. Dillon; Markus D. Groner; Steven M. George; Se-Hee Lee

Ultrathin atomic layer deposition (ALD) coatings enhance the performance of lithium-ion batteries (LIBs). Previous studies have demonstrated that LiCoO 2 cathode powders coated with metal oxides with thicknesses of ∼100 to 1000 A grown using wet chemical techniques improved LIB performance. In this study, LiCoO 2 powders were coated with conformal Al 2 O 3 ALD films with thicknesses of only ∼ 3 to 4 A established using two ALD cycles. The coated LiCoO 2 powders exhibited a capacity retention of 89% after 120 charge-discharge cycles in the 3.3-4.5 V (vs Li/Li + ) range. In contrast, the bare LiCoO 2 powders displayed only a 45% capacity retention. Al 2 O 3 ALD films coated directly on the composite electrode also produced improved capacity retention. This dramatic improvement may result from the ultrathin Al 2 O 3 ALD film acting to minimize Co dissolution or reduce surface electrolyte reactions. Similar experiments with ultrathin ZnO ALD films did not display enhanced performance.


ACS Applied Materials & Interfaces | 2011

Al2O3 and TiO2 Atomic Layer Deposition on Copper for Water Corrosion Resistance

Aziz I. Abdulagatov; Yiwei Yan; Jill Cooper; Yadong Zhang; Zachary M. Gibbs; Andrew S. Cavanagh; Ronggui Yang; Yung-Cheng Lee; Steven M. George

Al(2)O(3) and TiO(2) atomic layer deposition (ALD) were employed to develop an ultrathin barrier film on copper to prevent water corrosion. The strategy was to utilize Al(2)O(3) ALD as a pinhole-free barrier and to protect the Al(2)O(3) ALD using TiO(2) ALD. An initial set of experiments was performed at 177 °C to establish that Al(2)O(3) ALD could nucleate on copper and produce a high-quality Al(2)O(3) film. In situ quartz crystal microbalance (QCM) measurements verified that Al(2)O(3) ALD nucleated and grew efficiently on copper-plated quartz crystals at 177 °C using trimethylaluminum (TMA) and water as the reactants. An electroplating technique also established that the Al(2)O(3) ALD films had a low defect density. A second set of experiments was performed for ALD at 120 °C to study the ability of ALD films to prevent copper corrosion. These experiments revealed that an Al(2)O(3) ALD film alone was insufficient to prevent copper corrosion because of the dissolution of the Al(2)O(3) film in water. Subsequently, TiO(2) ALD was explored on copper at 120 °C using TiCl(4) and water as the reactants. The resulting TiO(2) films also did not prevent the water corrosion of copper. Fortunately, Al(2)O(3) films with a TiO(2) capping layer were much more resilient to dissolution in water and prevented the water corrosion of copper. Optical microscopy images revealed that TiO(2) capping layers as thin as 200 Å on Al(2)O(3) adhesion layers could prevent copper corrosion in water at 90 °C for ~80 days. In contrast, the copper corroded almost immediately in water at 90 °C for Al(2)O(3) and ZnO films by themselves on copper. Ellipsometer measurements revealed that Al(2)O(3) films with a thickness of ~200 Å and ZnO films with a thickness of ~250 Å dissolved in water at 90 °C in ~10 days. In contrast, the ellipsometer measurements confirmed that the TiO(2) capping layers with thicknesses of ~200 Å on the Al(2)O(3) adhesion layers protected the copper for ~80 days in water at 90 °C. The TiO(2) ALD coatings were also hydrophilic and facilitated H(2)O wetting to copper wire mesh substrates.


Journal of the American Chemical Society | 2011

Using Atomic Layer Deposition to Hinder Solvent Decomposition in Lithium Ion Batteries: First-Principles Modeling and Experimental Studies

Kevin Leung; Yue Qi; Kevin R. Zavadil; Yoon Seok Jung; Anne C. Dillon; Andrew S. Cavanagh; Se-Hee Lee; Steven M. George

Passivating lithium ion (Li) battery electrode surfaces to prevent electrolyte decomposition is critical for battery operations. Recent work on conformal atomic layer deposition (ALD) coating of anodes and cathodes has shown significant technological promise. ALD further provides well-characterized model platforms for understanding electrolyte decomposition initiated by electron tunneling through a passivating layer. First-principles calculations reveal two regimes of electron transfer to adsorbed ethylene carbonate molecules (EC, a main component of commercial electrolyte), depending on whether the electrode is alumina coated. On bare Li metal electrode surfaces, EC accepts electrons and decomposes within picoseconds. In contrast, constrained density functional theory calculations in an ultrahigh vacuum setting show that, with the oxide coating, e(-) tunneling to the adsorbed EC falls within the nonadiabatic regime. Here the molecular reorganization energy, computed in the harmonic approximation, plays a key role in slowing down electron transfer. Ab initio molecular dynamics simulations conducted at liquid EC electrode interfaces are consistent with the view that reactions and electron transfer occur right at the interface. Microgravimetric measurements demonstrate that the ALD coating decreases electrolyte decomposition and corroborates the theoretical predictions.


ChemPhysChem | 2010

Conformal Surface Coatings to Enable High Volume Expansion Li-Ion Anode Materials

Leah A. Riley; Andrew S. Cavanagh; Steven M. George; Yoon Seok Jung; Yanfa Yan; Se-Hee Lee; Anne C. Dillon

An alumina surface coating is demonstrated to improve electrochemical performance of MoO(3) nanoparticles as high capacity/high-volume expansion anodes for Li-ion batteries. Thin, conformal surface coatings were grown using atomic layer deposition (ALD) that relies on self-limiting surface reactions. ALD coatings were tested on both individual nanoparticles and prefabricated electrodes containing conductive additive and binder. The coated and non-coated materials were characterized using transmission electron microscopy, energy-dispersive X-ray spectroscopy, electrochemical impedance spectroscopy, and galvanostatic charge/discharge cycling. Importantly, increased stability and capacity retention was only observed when the fully fabricated electrode was coated. The alumina layer both improves the adhesion of the entire electrode, during volume expansion/contraction and protects the nanoparticle surfaces. Coating the entire electrode also allows for an important carbothermal reduction process that occurs during electrode pre-heat treatment. ALD is thus demonstrated as a novel and necessary method that may be employed to coat the tortuous network of a battery electrode.


Nanotechnology | 2009

Atomic layer deposition on gram quantities of multi-walled carbon nanotubes

Andrew S. Cavanagh; Christopher A. Wilson; Alan W. Weimer; Steven M. George

Atomic layer deposition (ALD) was employed to grow coaxial thin films of Al(2)O(3) and Al(2)O(3) /W bilayers on multi-walled carbon nanotubes (MWCNTs). Although the MWCNTs have an extremely high surface area, a rotary ALD reactor was successfully employed to perform ALD on gram quantities of MWCNTs. The uncoated and ALD-coated MWCNTs were characterized with transmission electron microscopy and x-ray photoelectron spectroscopy. Al(2)O(3) ALD on untreated MWCNTs was characterized by nucleation difficulties that resulted in the growth of isolated Al(2)O(3) nanospheres on the MWCNT surface. The formation of a physisorbed NO(2) monolayer provided an adhesion layer for the nucleation and growth of Al(2)O(3) ALD films. The NO(2) monolayer facilitated the growth of extremely conformal coaxial Al(2)O(3) ALD coatings on the MWCNTs. Cracks were also observed in the coaxial Al(2)O(3) ALD films on the MWCNTs. After cracking, the coaxial Al(2)O(3) ALD films were observed to slide on the surface of the MWCNTs and expose regions of bare MWCNTs. The Al(2)O(3) ALD film also served as a seed layer for the growth of W ALD on the MWCNTs. The W ALD films can significantly reduce the resistance of the W/Al(2)O(3)/MWCNT wire. The results demonstrate the potential for ALD films to tune the properties of gram quantities of very high surface area MWCNTs.


Journal of Applied Physics | 2011

Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma

L Baker; Andrew S. Cavanagh; Dragos Seghete; Steven M. George; Ajm Adrie Mackus; Wmm Erwin Kessels; Zy Liu; Ft Wagner

The nucleation and growth of Pt atomic layer deposition (ALD) on Al2O3 substrates was studied using (methylcyclopentadienyl)-trimethyl platinum (MeCpPtMe3) and O2 plasma as the reactants. The nucleation of Pt ALD was examined on Al2O3 ALD substrates at 300 °C using a variety of techniques including spectroscopic ellipsometry, x-ray reflectivity, x-ray photoelectron spectroscopy, and scanning electron microscopy. These techniques revealed that Pt ALD does not nucleate and grow immediately on the Al2O3 ALD substrates. There was negligible Pt ALD during the first 38 ALD cycles. The Pt ALD growth rate then increased substantially during the next 12 ALD cycles. Subsequently, the Pt ALD growth rate reached a steady state linear growth regime for >50 ALD cycles. These measurements suggest that the Pt ALD first forms a number of nanoclusters that grow slowly during the first 38 ALD cycles. These islands then merge during the next 12 cycles and yield a steady state Pt ALD growth rate of ∼0.05 nm/cycle for >50 ALD ...


Nano Letters | 2012

Ultrathin oxide films by atomic layer deposition on graphene

Luda Wang; Jonathan J. Travis; Andrew S. Cavanagh; Xinghui Liu; Steven P. Koenig; Pinshane Y. Huang; Steven M. George; J. Scott Bunch

In this paper, a method is presented to create and characterize mechanically robust, free-standing, ultrathin, oxide films with controlled, nanometer-scale thickness using atomic layer deposition (ALD) on graphene. Aluminum oxide films were deposited onto suspended graphene membranes using ALD. Subsequent etching of the graphene left pure aluminum oxide films only a few atoms in thickness. A pressurized blister test was used to determine that these ultrathin films have a Youngs modulus of 154 ± 13 GPa. This Youngs modulus is comparable to much thicker alumina ALD films. This behavior indicates that these ultrathin two-dimensional films have excellent mechanical integrity. The films are also impermeable to standard gases suggesting they are pinhole-free. These continuous ultrathin films are expected to enable new applications in fields such as thin film coatings, membranes, and flexible electronics.


Electrochemical and Solid State Letters | 2011

Improved Mechanical Integrity of ALD-Coated Composite Electrodes for Li-Ion Batteries

Leah A. Riley; Andrew S. Cavanagh; Steven M. George; Se-Hee Lee; Anne C. Dillon

Mechanical properties of composite anodes coated with by atomic layer deposition (ALD) were examined using nanoindentation and nanoscratching. Significant improvement in adhesion to the current collector for the ALD-coated is observed. This improved adhesion enables enhanced electrical conductivity for these high capacity/high volume expansion materials, suggesting the potential of these coatings for high-energy density Li-ion batteries suitable for vehicular applications.

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Steven M. George

University of Colorado Boulder

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Se-Hee Lee

University of Colorado Boulder

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Yoon Seok Jung

Ulsan National Institute of Science and Technology

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Anne C. Dillon

National Renewable Energy Laboratory

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Leah A. Riley

University of Colorado Boulder

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A. C. Dillon

University of Colorado Boulder

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Alan W. Weimer

University of Colorado Boulder

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Chunmei Ban

National Renewable Energy Laboratory

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Dragos Seghete

University of Colorado Boulder

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Aziz I. Abdulagatov

University of Colorado Boulder

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