Andrew Yacoot

Aspects of scanning force microscope probes and their effects on dimensional measurement

The review will describe the various scanning probe microscopy tips and cantilevers used today for scanning force microscopy and magnetic force microscopy. Work undertaken to quantify the properties of cantilevers and tips, e.g. shape and radius, is reviewed together with an overview of the various tip–sample interactions that affect dimensional measurements.

The European nanometrology landscape

This review paper summarizes the European nanometrology landscape from a technical perspective. Dimensional and chemical nanometrology are discussed first as they underpin many of the developments in other areas of nanometrology. Applications for the measurement of thin film parameters are followed by two of the most widely relevant families of functional properties: measurement of mechanical and electrical properties at the nanoscale. Nanostructured materials and surfaces, which are seen as key materials areas having specific metrology challenges, are covered next. The final section describes biological nanometrology, which is perhaps the most interdisciplinary applications area, and presents unique challenges. Within each area, a review is provided of current status, the capabilities and limitations of current techniques and instruments, and future directions being driven by emerging industrial measurement requirements. Issues of traceability, standardization, national and international programmes, regulation and skills development will be discussed in a future paper.

The use of x-ray interferometry to investigate the linearity of the NPL Differential Plane Mirror Optical Interferometer

The x-ray interferometer from the combined optical and x-ray interferometer (COXI) facility at NPL has been used to investigate the performance of the NPL Jamin Differential Plane Mirror Interferometer when it is fitted with stabilized and unstabilized lasers. This Jamin interferometer employs a common path design using a double pass configuration and one fringe is realized by a displacement of 158 nm between its two plane mirror retroreflectors. Displacements over ranges of several optical fringes were measured simultaneously using the COXI x-ray interferometer and the Jamin interferometer and the results were compared. In order to realize the highest measurement accuracy from the Jamin interferometer, the air paths were shielded to prevent effects from air turbulence and electrical signals generated by the photodetectors were analysed and corrected using an optimizing routine in order to subdivide the optical fringes accurately. When an unstabilized laser was used the maximum peak-to-peak difference between the two interferometers was 80 pm, compared with 20 pm when the stabilized laser was used.

Recent developments in dimensional nanometrology using AFMs

Scanning probe microscopes, in particular the atomic force microscope (AFM), have developed into sophisticated instruments that, throughout the world, are no longer used just for imaging, but for quantitative measurements. A role of the national measurement institutes has been to provide traceable metrology for these instruments. This paper presents a brief overview as to how this has been achieved, highlights the future requirements for metrology to support developments in AFM technology and describes work in progress to meet this need.

A heterodyne interferometer with periodic nonlinearities smaller than ?10?pm

The PTB developed a new optical heterodyne interferometer in the context of the European joint research project ?Nanotrace?. A new optical concept using plane-parallel plates and spatially separated input beams to minimize the periodic nonlinearities was realized. Furthermore, the interferometer has the resolution of a double-path interferometer, compensates for possible angle variations between the mirrors and the interferometer optics and offers a minimal path difference between the reference and the measurement arm. Additionally, a new heterodyne phase evaluation based on an analogue to digital converter board with embedded field programmable gate arrays was developed, providing a high-resolving capability in the single-digit picometre range. The nonlinearities were characterized by a comparison with an x-ray interferometer, over a measurement range of 2.2 periods of the optical interferometer. Assuming an error-free x-ray interferometer, the nonlinearities are considered to be the deviation of the measured displacement from a best-fit line. For the proposed interferometer, nonlinearities smaller than ?10 pm were observed without any quadrature fringe correction.

An atomic force microscope for the study of the effects of tip–sample interactions on dimensional metrology

An atomic force microscope (AFM) has been developed for studying interactions between the AFM tip and the sample. Such interactions need to be taken into account when making quantitative measurements. The microscope reported here has both the conventional beam deflection system and a fibre optical interferometer for measuring the movement of the cantilever. Both can be simultaneously used so as to not only servo control the tip movements, but also detect residual movement of the cantilever. Additionally, a high-resolution homodyne differential optical interferometer is used to measure the vertical displacement between the cantilever holder and the sample, thereby providing traceability for vertical height measurements. The instrument is compatible with an x-ray interferometer, thereby facilitating high resolution one-dimensional scans in the X-direction whose metrology is based on the silicon d220 lattice spacing (0.192 nm). This paper concentrates on the first stage of the instruments development and presents some preliminary results validating the instruments performance and showing its potential.

Measurement of picometre non-linearity in an optical grating encoder using x-ray interferometry

X-ray interferometry has been used to characterize the non-linearity in an optical encoder displacement measuring system. Traceable measurements of the non-linearity have been made and an estimation of the uncertainty associated with the measurements is given. Cyclic errors with a magnitude of up to 50 pm and periodicity of the encoder system (128 nm) have been recorded.

Methods for determining and processing 3D errors and uncertainties for AFM data analysis

This paper describes the processing of three-dimensional (3D) scanning probe microscopy (SPM) data. It is shown that 3D volumetric calibration error and uncertainty data can be acquired for both metrological atomic force microscope systems and commercial SPMs. These data can be used within nearly all the standard SPM data processing algorithms to determine local values of uncertainty of the scanning system. If the error function of the scanning system is determined for the whole measurement volume of an SPM, it can be converted to yield local dimensional uncertainty values that can in turn be used for evaluation of uncertainties related to the acquired data and for further data processing applications (e.g. area, ACF, roughness) within direct or statistical measurements. These have been implemented in the software package Gwyddion.

Advances in engineering nanometrology at the National Physical Laboratory

The National Physical Laboratory, UK, has been active in the field of engineering nanometrology for a number of years. A summary of progress over the last five years is presented in this paper and the following research projects discussed in detail. (1) Development of an infrastructure for the calibration of instruments for measuring areal surface topography, along with the development of areal software measurement standards. This work comprises the use of the optical transfer function and a technique for the simultaneous measurement of topography and the phase change on reflection, allowing composite materials to be measured. (2) Development of a vibrating micro-CMM probe with isotropic probing reaction and the ability to operate in a non-contact mode. (3) A review of x-ray computed tomography and its use in dimensional metrology. (4) The further development of a metrology infrastructure for atomic force microscopy and the development of an instrument for the measurement of the effect of the probe?surface interaction. (5) Traceable measurement of displacement using optical and x-ray interferometry to picometre accuracy. (6) Development of an infrastructure for low-force metrology, including the development of appropriate transfer artefacts.

A combined scanning tunnelling microscope and x-ray interferometer

A monolithic x-ray interferometer made from silicon and a scanning tunnelling microscope have been combined and used to calibrate grating structures with periodicities of 100 nm or less. The x-ray interferometer is used as a translation stage which moves in discrete steps of 0.192 nm, the lattice spacing of the silicon (220) planes. Hence, movements are traceable to the definition of the metre and the nonlinearity associated with the optical interferometers used to measure displacement in more conventional metrological scanning probe microscopes (MSPMs) removed.