Angela Duparré
University of Jena
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Featured researches published by Angela Duparré.
Applied Optics | 1992
Samer Kassam; Angela Duparré; Karl Hehl; Peter Bussemer; Jakob Neubert
A theoretical model is presented that describes the volume scattering in thin optical films, particularly in typical columnar structures. It is based on a first-order perturbation theory that concerns the fluctuation of the dielectric permittivity in the film. For evaporated PbF(2) films that show a pronounced columnar morphology, angular as well as total integrated scattering measurements at lambda = 633 nm have been performed on a special layer design to suppress roughness-induced scattering. A comparison of the predicted theoretical and the measured experimental values leads to such structural parameters as packing density and the evolutionary exponent of the columns.
Journal of Modern Optics | 1990
Angela Duparré; Reinhard Dohle; Heinz Müller
Abstract A statistical model is presented describing the surface roughness of columnar structured thin films. Based on this model, a formula has been derived relating total integrated light scattering to the evolutionary exponent that represents a quantitative characterization of the evolution of the columns with film thickness. The examination of evaporated PbF2 films offers the opportunity to test the suitability of the theoretical considerations by comparing results calculated from scattering data with transmission electron microscopy observations.
Proceedings of SPIE | 2012
Marcus Trost; Sven Schröder; C. C. Lin; Angela Duparré; Andreas Tünnermann
Optical components for the extreme ultraviolet (EUV) face stringent requirements for surface finish, because even small amounts of surface and interface roughness can cause significant scattering losses and impair image quality. In this paper, we investigate the roughness evolution of Mo/Si multilayers by analyzing the scattering behavior at a wavelength of 13.5 nm as well as taking atomic force microscopy (AFM) measurements before and after coating. Furthermore, a new approach to measure substrate roughness is presented, which is based on light scattering measurements at 405 nm. The high robustness and sensitivity to roughness of this method are illustrated using an EUV mask blank with a highspatial frequency roughness of as low as 0.04 nm.
Journal of Modern Optics | 1991
Angela Duparré
Abstract The dependence of total integrated light scattering on film thickness is investigated for evaporated PbF2-films and magnetron sputtered Nb2O5-films. The experimental results are discussed on the basis of theoretical model assumptions, relating the scattering behaviour to interface roughness cross-correlation effects as well as to the evolution of film morphology with increasing film thickness. Electron microscopy examinations serve to make evident the different film structures responsible for the specific scattering properties observed.
Applied Optics | 1986
Heinz-Günter Walther; Angela Duparré; G. Schirmer
On decrit un modele decrivant la rugosite statistique de la couche mince. En se basant sur ce modele on est capable de prevoir les conditions pour obtenir une reduction de la diffusion
Proceedings of SPIE | 1991
Angela Duparré; Samer Kassam
Light scattering measurements can be used for determining roughness as well as volume structure parameters of optical thin films. A method of structural analysis is outlined, which allows a quantitative estimation of roughness parameters, mean columnar diameter, packing density, and the evolutionary exponent, respectively.
1988 International Congress on Optical Science and Engineering | 1989
Heinz-Günter Walther; Angela Duparré
A model describing the modification of a surface roughness profile due to thin film deposition is presented. Surface smoothing as well as roughening are found to be significant effects. Conclusions which can be drawn from the roughness model with respect to related light scattering make it possible to interpret film scattering experimentally observed.
Optical Instrument Science, Technology, and Applications | 2018
Dina Katsir; Alexander Yevtushenko; A. von Finck; Angela Duparré
One of the largest challenges for optical systems is eliminating stray light generated by reflections off the walls and other optical elements of the device. Most black coatings are not sufficiently effective at grazing angles. Acktar’s black coatings exhibit particularly low residual reflectance and have been implemented in various instruments. The new proposed material exhibits particularly low hemispherical and specular reflectance – especially at grazing angles.
International Conference on Space Optics — ICSO 2014 | 2017
Sven Schröder; Tobias Herffurth; Marcus Trost; T. Weigel; Matthias Hauptvogel; A. von Finck; Angela Duparré; Bruno Cugny; Zoran Sodnik; Nikos Karafolas
The rapid developments in optical technologies generate increasingly higher and sometimes completely new demands on the quality of materials, surfaces, components, and systems. Examples for such driving applications are the steadily shrinking feature sizes in semiconductor lithography, nanostructured functional surfaces for consumer optics, and advanced optical systems for astronomy and space applications. The reduction of surface defects as well as the minimization of roughness and other scatter-relevant irregularities are essential factors in all these areas of application. Quality-monitoring for analysing and improving those properties must ensure that even minimal defects and roughness values can be detected reliably. Light scattering methods have a high potential for a non-contact, rapid, efficient, and sensitive determination of roughness, surface structures, and defects.
Applied Optics | 1988
Angela Duparré; Heinz-Günter Walther