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Angelo A. Lamola

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Publication

Featured researches published by Angelo A. Lamola.

Advances in Resist Technology and Processing VII | 1990

Chemically amplified resists for I-line and G-line applications

Amanda K. Berry; Wayne E. Feely; Stephen D. Thompson; Gary S. Calabrese; Roger F. Sinta; Angelo A. Lamola; James W. Thackeray; George W. Orsula

This paper describes the evaluation of several phenothiazine and benzophenothiazine derivatives which are useful as i-line and g-line photosensitizers for a class of chemically amplified crosslinked resists. Data supporting an electron transfer mechanism of sensitization from the excited state of the sensitizer to the acid generator are provided. Initial lithographic screening demonstrates the potential for both high sensitivity and submicron resolution in these systems.

Archive | 2004

Radiation sensitive compositions and methods

James W. Thackeray; Angelo A. Lamola

Archive | 1990

Near UV photoresist

Angelo A. Lamola; Gary S. Calabrese; Roger F. Sinta

Chemistry of Materials | 1991

Photophysical and photochemical studies of phenothiazine and some derivatives: exploratory studies of novel photosensitizers for photoresist technology

Mónica Barra; Gary S. Calabrese; Mary Tedd Allen; Robert W. Redmond; R. Sinta; Angelo A. Lamola; Richard D. Small; J. C. Scaiano

Archive | 1999

RADIATION SENSITIVE COMPOSITIONS COMPRISING COMPLEXING POLAR COMPOUND AND METHODS OF USE THEREOF

James W. Thackeray; Angelo A. Lamola

Journal of Photopolymer Science and Technology | 1990

Some Resists Based On Chemically-Amplified Crosslinking Of Phenolic Polymers

John F. Bohland; Gary S. Calabrese; Michael F. Cronin; Diane L. Canistro; Theodore H. Fedynyshyn; Joseph J. Ferrari; Angelo A. Lamola; George W. Orsula; Edward K. Pavelchek; Roger F. Sinta; James W. Thackeray; Amanda K. Berry; Leonard E. Pogan; Mark P. de Grandpre; Wayne E. Feely; Karen A. Graziano; Robert J. Olsen; Steven Thompson; Mark R. Winkle

Journal of Photopolymer Science and Technology | 1992

Factors Affecting the Performance of Chemically Amplified DUV Positive Photoresists.

James W. Thackeray; Theodore H. Fedynyshyn; Angelo A. Lamola; Richard D. Small

Journal of Photopolymer Science and Technology | 1991

Further Advances in Chemistry and Technology of Acid-Hardened Resists

M.T. Allen; Gary S. Calabrese; Angelo A. Lamola; George W. Orsula; M.M. Rajaratnam; Roger F. Sinta; James W. Thackeray

Archive | 1992

Radiation-sensitive composition, and its production

Angelo A. Lamola; James W. Thackeray; アンジエロ・エイ・ラモラ; ジエイムズ・ダブリユ・サツカリー

Archive | 1992

Compositions sensibles aux radiations et procédés

James W. Thackeray; Angelo A. Lamola

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James W. Thackeray

Dow Chemical Company

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Roger F. Sinta

State University of New York System

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George W. Orsula

IBM

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Amanda K. Berry

Rohm and Haas

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Theodore H. Fedynyshyn

Massachusetts Institute of Technology

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Wayne E. Feely

Rohm and Haas

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Karen A. Graziano

Rohm and Haas

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Leonard E. Pogan

Rohm and Haas

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Mark P. de Grandpre

Rohm and Haas

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Mark R. Winkle

Rohm and Haas

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