Armin Gölzhäuser

Electron-induced crosslinking of aromatic self-assembled monolayers: Negative resists for nanolithography

We have explored the interaction of self-assembled monolayers of 1,1′-biphenyl-4-thiol (BPT) with low energy electrons. X-ray photoelectron, infrared, and near edge x-ray absorption fine structure spectroscopy showed that BPT forms well-ordered monolayers with the phenyl rings tilted ∼15° from the surface normal. The films were exposed to 50 eV electrons and changes were monitored in situ. Even after high (∼10 mC/cm2) exposures, the molecules maintain their preferred orientation and remain bonded on the gold substrate. An increased etching resistance and changes in the infrared spectra imply a crosslinking between neighboring phenyl groups, which suggests that BPT can be utilized as an ultrathin negative resist. This is demonstrated by the generation of patterns in the underlying gold.

One Nanometer Thin Carbon Nanosheets with Tunable Conductivity and Stiffness

Atomically thin (similar to 1 nm) carbon films and membranes whose electrical behavior can be tuned from insulating to conducting are fabricated by a novel route. These films present arbitrary size and shape based on molecular self-assembly, electron irradiation, and pyrolysis, and their technical applicability is demonstrated by their incorporation into a microscopic pressure sensor.

Nanoscale patterning of self-assembled monolayers with electrons

We show the fabrication of gold nanostructures using self-assembled monolayers of aliphatic and aromatic thiols as positive and negative electron beam resists. We applied a simple and versatile proximity printing technique using focused ion beam structured stencil masks and low energy (300 eV) electrons. We also used conventional e-beam lithography with a beam energy of 2.5 keV and doses from 3500 to 80 000 μC/cm2. Gold patterns were generated by wet etching in KCN/KOH and characterized by atomic force microscopy and scanning electron microscopy. The width of the finest lines is ∼20 nm; their edge definition is limited by the isotropic etching process in the polycrystalline gold.

Toward Plasmonics with Nanometer Precision: Nonlinear Optics of Helium-Ion Milled Gold Nanoantennas

Plasmonic nanoantennas are versatile tools for coherently controlling and directing light on the nanoscale. For these antennas, current fabrication techniques such as electron beam lithography (EBL) or focused ion beam (FIB) milling with Ga(+)-ions routinely achieve feature sizes in the 10 nm range. However, they suffer increasingly from inherent limitations when a precision of single nanometers down to atomic length scales is required, where exciting quantum mechanical effects are expected to affect the nanoantenna optics. Here, we demonstrate that a combined approach of Ga(+)-FIB and milling-based He(+)-ion lithography (HIL) for the fabrication of nanoantennas offers to readily overcome some of these limitations. Gold bowtie antennas with 6 nm gap size were fabricated with single-nanometer accuracy and high reproducibility. Using third harmonic (TH) spectroscopy, we find a substantial enhancement of the nonlinear emission intensity of single HIL-antennas compared to those produced by state-of-the-art gallium-based milling. Moreover, HIL-antennas show a vastly improved polarization contrast. This superior nonlinear performance of HIL-derived plasmonic structures is an excellent testimonial to the application of He(+)-ion beam milling for ultrahigh precision nanofabrication, which in turn can be viewed as a stepping stone to mastering quantum optical investigations in the near-field.

A Universal Scheme to Convert Aromatic Molecular Monolayers into Functional Carbon Nanomembranes

Free-standing nanomembranes with molecular or atomic thickness are currently explored for separation technologies, electronics, and sensing. Their engineering with well-defined structural and functional properties is a challenge for materials research. Here we present a broadly applicable scheme to create mechanically stable carbon nanomembranes (CNMs) with a thickness of ~0.5 to ~3 nm. Monolayers of polyaromatic molecules (oligophenyls, hexaphenylbenzene, and polycyclic aromatic hydrocarbons) were assembled and exposed to electrons that cross-link them into CNMs; subsequent pyrolysis converts the CNMs into graphene sheets. In this transformation the thickness, porosity, and surface functionality of the nanomembranes are determined by the monolayers, and structural and functional features are passed on from the molecules through their monolayers to the CNMs and finally on to the graphene. Our procedure is scalable to large areas and allows the engineering of ultrathin nanomembranes by controlling the composition and structure of precursor molecules and their monolayers.

Conversion of Self-Assembled Monolayers into Nanocrystalline Graphene: Structure and Electric Transport

Graphene-based materials have been suggested for applications ranging from nanoelectronics to nanobiotechnology. However, the realization of graphene-based technologies will require large quantities of free-standing two-dimensional (2D) carbon materials with tunable physical and chemical properties. Bottom-up approaches via molecular self-assembly have great potential to fulfill this demand. Here, we report on the fabrication and characterization of graphene made by electron-radiation induced cross-linking of aromatic self-assembled monolayers (SAMs) and their subsequent annealing. In this process, the SAM is converted into a nanocrystalline graphene sheet with well-defined thickness and arbitrary dimensions. Electric transport data demonstrate that this transformation is accompanied by an insulator to metal transition that can be utilized to control electrical properties such as conductivity, electron mobility, and ambipolar electric field effect of the fabricated graphene sheets. The suggested route opens broad prospects toward the engineering of free-standing 2D carbon materials with tunable properties on various solid substrates and on holey substrates as suspended membranes.

Growth and the diffusion of platinum atoms and dimers on Pt (111)

Abstract The diffusion of platinum adatoms and dimers on Pt(111) has been measured at different temperatures by direct observation in a low-temperature field ion microscope. The activation energy for single atom motion is found to be 0.260 ± 0.003 eV, while for dimers it is 0.37 ± 0.02 eV. Comparison with previous results obtained in STM studies of the density of islands after deposition from the vapor as well as with theoretical estimates are now possible. The former are in excellent agreement, the latter less so, but empirical extrapolation from the neighboring iridium proves useful. Contributions from dimer diffusion to growth at low temperatures can also be assessed, and are found to be minor.

High thermal stability of cross-linked aromatic self-assembled monolayers: Nanopatterning via selective thermal desorption

An extremely high thermal stability of electron cross-linked biphenyl self-assembled monolayers (SAMs) is reported. The authors found that pristine biphenylthiol SAMs desorb at ∼400K from gold surfaces, which is induced by a breaking of C–S bonds. Despite of a similar bond cleavage in cross-linked SAMs, these remain on the surface up to 1000K, which is the highest temperature reported for a SAM. When patterns of pristine and cross-linked SAMs are heated, the pristine regions desorb, and the cross-linked regions remain on the surface. The authors show that this thermal desorption lithography can be utilized for the fabrication of molecular surface nanostructures.

Nanostructuring of silicon by electron-beam lithography of self-assembled hydroxybiphenyl monolayers

We report the fabrication of silicon nanostructures using aromatic hydroxybiphenyl self-assembled monolayers as ultrathin (1.1 nm) negative tone electron-beam resist. The formation of the monolayer and the electron-induced crosslinking have been characterized by x-ray photoelectron spectroscopy. Nanometer size patterns were defined by electron-beam lithography in the molecular layer and transferred into silicon by wet chemical etching with potassium hydroxide. We demonstrate the fabrication of silicon line gratings with a resolution of ∼20 nm and of isolated silicon lines with linewidths down to ∼10 nm.

Modification of alkanethiolate monolayers on Au-substrate by low energy electron irradiation: Alkyl chains and the S/Au interface

Low-energy electron irradiation damage in alkanethiol (AT) self-assembled monolayers (SAM) has been studied by using hexadecanethiolate [HDT: CH3–(CH2)15–S-] film on Au-substrate as a model system. The induced changes were monitored by insitu photoelectron spectroscopy and angle resolved near edge X-ray absorption fine structure spectroscopy. AT SAMs are found to be very sensitive to low-energy electron irradiation. Both the alkyl chains and the S/Au interface are affected simultaneously through the electron-induced dissociation of C–H, C–C, C–S, and Au–thiolate bonds. The most noticeable processes are the loss of the orientational and conformational order, partial dehydrogenation and desorption of the film, and the appearance of new sulfur species. The latter process can be related to the formation of disulfide at the S/Au interface or an incorporation of the thiolate (or the corresponding radical) into the alkyl matrix via bonding to irradiation-induced carbon radicals in the adjacent aliphatic chains. The most essential damage in the AT films occurs in the early stages of irradiation. Irradiation with a dose of 1000 µC cm-2 (about 13 electrons per HDT chain) at the primary electron energy of 50 eV results in almost complete breakdown of the orientational order in the initially well-ordered HDT film, a decrease of its thickness by about 25%, and a destruction of ≈40% of the original Au–thiolate bonds. The film becomes a disordered structure comprising both saturated and unsaturated hydrocarbons. Further irradiation of the residual film is accompanied by a continuous C–C bond cleavage and the desorption of the remaining hydrogen, which merely leads to increasing cross-linking and the transformation of saturated hydrocarbons into unsaturated ones through C2C double bond formation.