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Dive into the research topics where Arnold Steinman is active.

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Featured researches published by Arnold Steinman.


electrical overstress electrostatic discharge symposium | 1999

Test methodologies for detecting ESD events in automated processing equipment

Arnold Steinman; J. Bernier; D. Boehm; T. Albano; W. Tan; D. Pritchard

ESD events cause device damage and equipment malfunctions in automated processing equipment. This paper surveys the problems caused by static charge in automated processing equipment. It looks at a number of test methods that detect those charges and the ESD events that occur in this equipment. It also provides examples of using these techniques to solve factory problems.


electrical overstress/electrostatic discharge symposium | 2004

CPM study: Discharge time and offset voltage, their relationship to plate geometry

Richard Rodrigo; Donn G. Bellmore; Jacquana Diep; Timothy Jarrett; Niels M Jonassen; Carl Newberg; Dale Parkin; Donald Pritchard; Jeff Salisbury; Arnold Steinman; Julius A. Turangan

Air ionizers are used during the fabrication and assembly of very small components and sub assemblies that are static sensitive. The plate of a standard charged plate monitor (CPM) is relatively large in comparison. Questions have arisen about the relevancy of CPM test results with respect to very small components. The Ionization Committee of the ESD Association performed tests to investigate this relationship.


electrical overstress electrostatic discharge symposium | 2015

Manufacturing changes air ionization technology

Arnold Steinman

Manufacturing has brought increased semiconductor device functionality through smaller geometries, larger wafer sizes, and faster operating speeds, as well as increased disk drive storage density and display sizes. To produce these advanced technologies the use of air ionization for static control has changed. This paper explores new ionization requirements and methods.


advanced semiconductor manufacturing conference | 2009

Increasing yields with in-tool ionization

Arnold Steinman

Smaller feature dimensions of semiconductor devices mean that “killer particle” sizes are also smaller. Static charge affects process yields by increased attraction of these smaller particles to critical product surfaces. This paper describes a study that establishes the affect of charge neutralization in reducing Particles per Wafer Pass (PWP). Cost of ownership analysis shows the positive results on yield and return on investment (ROI).


electrical overstress electrostatic discharge symposium | 1997

Static Control Technology Preserves Ancient Egyptian Artifacts

Arnold Steinman

Ancient Egyptian artifacts were deteriorating due to the long term effects of their storage in plastic. Attempts to remove the artifacts caused additional damage. The problem was diagnosed to be due to static charge, and a method was developed to safely remove the artifacts. Due to the insulating materials involved, air ionization was used to eliminate the static charge problem.


Archive | 1990

Apparatus for Measuring Ultrafine Particle Emissions from Air Ionization Equipment

Michael G. Yost; Arnold Steinman; Al Lieberman

Recent work has established that electrostatically charged surfaces can increase particle deposition rates. This increase in particle deposition can become especially critical in cleanrooms. Air ionization is one technique that can effectively neutralize surface charges on products in cleanrooms. However, a few papers have suggested that some corona discharge air ionization equipment may release particles. A need exists for a test method to measure and characterize the emission of particles from air ionization equipment.


Archive | 1988

Method and apparatus for regulating air ionization

Arnold Steinman; Michael G. Yost


Archive | 1984

Method and apparatus for sequenced bipolar air ionization

Scott Gehlke; Michael G. Yost; Arnold Steinman


Archive | 1987

Self-regulating air ionizing apparatus

Arnold Steinman; Michael G. Yost; Donald A. Gehlke


Microcontamination | 1986

ELECTROSTATIC ATTRACTION AND PARTICLE CONTROL.

Michael G. Yost; Arnold Steinman

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Carl Newberg

University of Rochester

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Maciej A. Noras

University of North Carolina at Charlotte

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