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Artur Högele

Carl Zeiss AG

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Publication

Featured researches published by Artur Högele.

Archive | 2008

Verfahren zur Einstellung einer Beleuchtungswinkelverteilung und gleichzeitig einer Intensitätsverteilung über ein in ein Bildfeld abzubildendes Objektfeld

Heiko Feldmann; Artur Högele

Archive | 2008

Illumination angle distribution and intensity distribution adjusting method for lithography projection illumination system, involves varying expansion coefficient and air-gap distance, so that difference of phase deviations is minimized

Artur Högele; Heiko Feldmann

Archive | 2008

Projection lens for micro lithography, has multiple lenses with local optical axis, where one lens is assigned to manipulator with actuators, and input force or input torque is attained by former actuators

Sascha Bleidistel; Andreas Frommeyer; Toralf Gruner; Artur Högele; Wolfgang Hummel; Thomas Schletterer; Armin Schöppach; Bärbel Schwaer; Jochen Schwaer

Archive | 2006

Illumination system for a microlithgraphic exposure apparatus

Alexander Sohmer; Aurelian Dodoc; Heiko Feldmann; Wilhelm Ulrich; Gerhard Fürter; Rafael Egger; Artur Högele; Michael Raum

Archive | 2010

Light source for e.g. surgical microscope, has semiconductor light source field including lighting surfaces that are reproduced with different wavelengths of lens combination and superimpose at inlet end

Artur Högele

Archive | 2010

Stereoscopic optical viewing device has multi-channel optics with two stereoscopic optical channels having optical channels, where afocal optical interface device is arranged before optical inlet end of multi-channel optics

Artur Högele

Archive | 2009

Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie

Artur Högele; Markus Degünther

Archive | 2004

Optical arrangement having a lens of single-axis, double-refracting material

Artur Högele; Karl-Heinz Schuster

Archive | 2003

Projektionsbelichtungsanlage und Verfahren zur Homogenisierung optischer Eigenschaften einer optischen Komponente

Markus Degünther; Heiko Feldmann; Gerhard Fürter; Artur Högele; Johannes Wangler

Archive | 2005

Projection objective lens mounting and aligning method, for lithography, involves assembling optical units to form lens, which is mounted/aligned based on azimuth angular position, which is determined based on inhomogeneities of one unit

Boris Bittner; Toralf Gruner; Artur Högele; Jürgen Müller; Norbert Wabra

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Christoph Hauger

Carl Zeiss AG

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Enrico Geissler

Carl Zeiss AG

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Christoph Nieten

Carl Zeiss AG

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Heiko Feldmann

Carl Zeiss AG

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Markus Degünther

Carl Zeiss AG

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Marco Pretorius

Carl Zeiss AG

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Gerhard Fürter

Carl Zeiss AG

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Joachim Steffen

Carl Zeiss Meditec

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Markus Seesselberg

Carl Zeiss AG

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Bryce Anton Moffat

Carl Zeiss AG

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