Artur Högele

Verfahren zur Einstellung einer Beleuchtungswinkelverteilung und gleichzeitig einer Intensitätsverteilung über ein in ein Bildfeld abzubildendes Objektfeld

Illumination angle distribution and intensity distribution adjusting method for lithography projection illumination system, involves varying expansion coefficient and air-gap distance, so that difference of phase deviations is minimized

Projection lens for micro lithography, has multiple lenses with local optical axis, where one lens is assigned to manipulator with actuators, and input force or input torque is attained by former actuators

Illumination system for a microlithgraphic exposure apparatus

Light source for e.g. surgical microscope, has semiconductor light source field including lighting surfaces that are reproduced with different wavelengths of lens combination and superimpose at inlet end

Stereoscopic optical viewing device has multi-channel optics with two stereoscopic optical channels having optical channels, where afocal optical interface device is arranged before optical inlet end of multi-channel optics

Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie

Optical arrangement having a lens of single-axis, double-refracting material

Projektionsbelichtungsanlage und Verfahren zur Homogenisierung optischer Eigenschaften einer optischen Komponente

Projection objective lens mounting and aligning method, for lithography, involves assembling optical units to form lens, which is mounted/aligned based on azimuth angular position, which is determined based on inhomogeneities of one unit