Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Asakura Toshikage is active.

Publication


Featured researches published by Asakura Toshikage.


Archive | 2000

Oxime derivatives as latent acids in photoresist compositions

Asakura Toshikage; Yamato Hitoshi; Ohwa Masaki; Birbaum Jean-Luc; Dietliker Kurt; Tanabe Junichi


Archive | 2000

Iodoniumsalze als latente Säurespender

Schulz Reinhard; Birbaum Jean-Luc; Wolf Jean-Pierre; Ilg Stephan; Yamato Hitoshi; Asakura Toshikage


Archive | 2000

Light activated compositions

Asakura Toshikage; Bleier Hartmut; Leo Christoph De


Archive | 2000

Light activated composition used to prepare chemically amplified photoresists, etc., includes a photoinitiator which will generate an acid when exposed to light at 240-390 nm

Asakura Toshikage; Bleier Hartmut; De Leo Christoph


Archive | 2016

Halogenated oxime derivatives and their use as potential acid

Yamato Hitoshi; Asakura Toshikage; Matsumoto Akira; Murer Peter; Hintermann Tobias


Archive | 2010

OXIMDERIVATE UND IHRE VERWENDUNG ALS LATENTE SAÜRE

Yamato Hitoshi; Asakura Toshikage; Matsumoto Akira; Ohwa Masaki


Archive | 2009

Strålingsfölsom sammensætning indeholdende et diaryliodoniumsalt, anvendelse af et diaryliodoniumsalt som fotolatent syredonor, fremgangsmåde til polymerisation eller tværbinding, overtrukket substrat, fremgangsmåde til fremstilling af reliefbilleder,

Schulz Reinhard; Birbaum Jean-Luc; Wolf Jean-Pierre; Ilg Stephan; Yamato Hitoshi; Asakura Toshikage


Archive | 2008

Iodonium salts and use thereof as photoinitiators in radiation-sensitive compositions

Schulz Reinhard; Birbaum Jean-Luc; Wolf Jean-Pierre; Ilg Stephan; Yamato Hitoshi; Asakura Toshikage


Archive | 2008

ONIUMSALZE UND IHRE VERWENDUNG ALS LATENTE SÄUREN

Yamato Hitoshi; Asakura Toshikage; Matsumoto Akira; Ohwa Masaki


Archive | 2007

Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition

Yamato Hitoshi; Asakura Toshikage; Matsumoto Akira; Ohwa Masaki

Collaboration


Dive into the Asakura Toshikage's collaboration.

Top Co-Authors

Avatar

Yamato Hitoshi

Ciba Specialty Chemicals

View shared research outputs
Top Co-Authors

Avatar
Top Co-Authors

Avatar

Ohwa Masaki

Ciba Specialty Chemicals

View shared research outputs
Top Co-Authors

Avatar

Ilg Stephan

Ciba Specialty Chemicals

View shared research outputs
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar

Bleier Hartmut

Ciba Specialty Chemicals

View shared research outputs
Top Co-Authors

Avatar

Dietliker Kurt

Ciba Specialty Chemicals

View shared research outputs
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge