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Featured researches published by Ashok K. Kapoor.


IEEE Transactions on Electron Devices | 1986

A low-barrier Schottky process using MoSi 2

Ashok K. Kapoor; Michael E. Thomas; M.B. Vora

A technology to produce low-barrier MoSi2Schottky diodes for use in LSI bipolar circuits has been developed. Molybdenum disilicide is formed on single-crystal silicon by a self-aligned process under extremely clean conditions. Auger electron spectroscopy (AES) and infrared (IR) absorption techniques are used extensively to monitor the formation and thickness of MoSi2films. Capacitance-voltage and current-voltage measurements at varying temperatures are employed to characterize the Schottky barrier, which has a measured potential of 0.66 eV.


Archive | 1989

Extended silicide and external contact technology

Madhukar B. Vor; Gregory N. Burton; Ashok K. Kapoor


Archive | 1984

Method and structure for inhibiting dopant out-diffusion

Michael E. Thomas; Madhukar B. Vora; Ashok K. Kapoor


Archive | 1988

Structure for inhibiting dopant out-diffusion

Michael E. Thomas; Madhukar B. Vora; Ashok K. Kapoor


Archive | 1985

Self-aligned silicide base contact for bipolar transistor

Ashok K. Kapoor; Hemraj K. Hingarh


Archive | 1992

Method of fabricating a base-coupled transistor logic

Ashok K. Kapoor


Archive | 1990

Base-coupled transistor logic

Ashok K. Kapoor


Archive | 1988

Integrated transistor and manufacturing process therefor

Ashok K. Kapoor; Frank J. Ciacchella


Archive | 1986

Interconnection for an integrated circuit.

Madhukar B. Vora; Greg Burton; Ashok K. Kapoor


Archive | 1988

Fabrication of polycrystalline silicon resistors

Ashok K. Kapoor

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