Is this you? Create Your Porfile
Avatar

Atsushi Shiota

Toshiba

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Atsushi Shiota is active.

Explore More

Publication

Featured researches published by Atsushi Shiota.

Archive | 2001

Composition for film formation, method of film formation, and silica-based film

Eiji Hayashi; Michinori Nishikawa; Atsushi Shiota; Kinji Yamada

Archive | 2000

Composition for film formation, method of film formation, and insulating film

Takahiko Kurosawa; Eiji Hayashi; Seo Youngsoon; Atsushi Shiota; Kinji Yamada

Archive | 2008

Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device

Hajime Tsuchiya; Hiromi Egawa; Terukazu Kokubo; Atsushi Shiota

Archive | 2005

Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device

Hajime Tsuchiya; Seitaro Hattori; Masahiro Akiyama; Atsushi Shiota

Archive | 2002

Method for the formation of silica film, silica film, insulating film, and semiconductor device

Eiji Hayashi; Atsushi Shiota; Michinori Nishikawa; Kinji Yamada

Archive | 2005

Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation

Masahiro Akiyama; Hisashi Nakagawa; Tatsuya Yamanaka; Atsushi Shiota; Takahiko Kurosawa

Archive | 2006

Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same

Hisashi Nakagawa; Masahiro Akiyama; Takahiko Kurosawa; Atsushi Shiota

Archive | 2006

METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM

Hisashi Nakagawa; Masahiro Akiyama; Takahiko Kurosawa; Atsushi Shiota

Archive | 2002

Method of film formation, insulating film, and substrate for semiconductor

Michinori Nishikawa; Manabu Sekiguchi; Matthias Patz; Mutsuhiko Yoshioka; Atsushi Shiota; Kinji Yamada

Archive | 2001

Method of forming insulating film and process for producing semiconductor device

Rempei Nakata; Nobuhide Yamada; Hideshi Miyajima; Akihiro Kojima; Takahiko Kurosawa; Eiji Hayashi; Youngsoon Seo; Atsushi Shiota; Kinji Yamada

Explore More

Collaboration

Dive into the Atsushi Shiota's collaboration.

Top Co-Authors
Avatar

Takahiko Kurosawa

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Kinji Yamada

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Eiji Hayashi

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Hisashi Nakagawa

Tokyo Electron

View shared research outputs
Top Co-Authors
Avatar

Akihiro Kojima

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Hideshi Miyajima

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Nobuhide Yamada

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Rempei Nakata

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Youngsoon Seo

Toshiba

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge