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Bastian Marten Noller

Bosch

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Featured researches published by Bastian Marten Noller.

Archive | 2011

Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films

Shyam Sundar Venkataraman; Eason Yu-Shen Su; Arend Jouke Kingma; Bastian Marten Noller

Archive | 2012

A chemical mechanical polishing (cmp) composition comprising a polymeric polyamine

Bastian Marten Noller; Yuzhuo Li; Diana Franz; Kenneth Rushing; Michael Lauter; Daniel Kwo-Hung Shen; Yongqing Lan; Zhenyu Bao

Archive | 2011

AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS

Bastian Marten Noller; Diana Franz; Yuzhuo Li; Sheik Ansar Usman Ibrahim; Harvey Wayne Pinder; Shyam Sundar Venkataraman

Archive | 2012

A chemical mechanical polishing (cmp) composition comprising two types of corrosion inhibitors

Bastian Marten Noller; Michael Lauter; Albert Budiman Sugiharto; Yuzhuo Li; Kenneth Rushing; Diana Franz; Roland Böhn

Archive | 2016

CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA

Michael Lauter; Yuzhuo Li; Bastian Marten Noller; Roland Lange; Robert Reichardt; Yongqing Lan; Volodymyr Boyko; Alexander Kraus; Joachim Von Seyerl; Sheik Ansar Usman Ibrahim; Aax Siebert; Kristine Hartnagel; Joachim Dengler; Nina Susanne Hillesheim

Archive | 2013

PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING (CMP) OF III-V MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A COMPOUND CONTAINING AN N-HETEROCYCLE

Diana Franz; Bastian Marten Noller

Archive | 2013

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A PROTEIN

Yuzhuo Li; Bastian Marten Noller; Michael Lauter; Roland Lange

Archive | 2013

A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (cmp) of iii-v material in the presence of a cmp composition comprising a specific non-ionic surfactant

Bastian Marten Noller; Christophe Gillot; Diana Franz; Yuzhuo Li

Archive | 2015

A chemical mechanical polishing (cmp) composition comprising a poly(aminoacid)

Michael Lauter; Roland Lange; Bastian Marten Noller; Max Siebert

Archive | 2017

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE POLISHING OF SUBSTRATES COMPRISING GERMANIUM

Max Siebert; Michael Lauter; Yongqing Lan; Robert Reichardt; Alexandra Muench; Manuel Six; Gerald Daniel; Bastian Marten Noller; Kevin Huang; Ibrahim Sheik Ansar Usman

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Diana Franz

Bosch

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Joachim Dengler

Bosch

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