Boo-Deuk Kim

Synthesis of ArF photoresist polymer composed of three methacrylate monomers via reversible addition-fragmentation chain transfer (RAFT) polymerization

METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE

Adhesive compound and method for forming photoresist pattern using the same

Method of forming protection layer on photoresist pattern and method of forming fine pattern using the same

Silicone hyper-branched polymer surfactant, method of preparing the same and method of rinsing using a rinsing solution comprising the same

Photoresist compositions and methods of forming a pattern using the same

INCLUSION COMPLEX, PHOTORESIST COMPOSITION HAVING THE INCLUSION COMPLEX AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION

Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same

Method of forming a pattern and method of manufacturing a capacitor using the same

Photoresist composition and method of forming a pattern using same