Brian J. Eves

Report on an international comparison of one-dimensional (1D) grating pitch

This paper reports results of an international comparison of one-dimensional (1D) grating pitch calibration by optical diffraction. Comparison results are analysed and discussed following the recommended guidelines for the analysis of CIPM key comparisons. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by SIM, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

Imaging laser diffractometer for traceable grating pitch calibration

A laser diffractometer for calibrating grating pitch is being developed at the National Research Council (NRC). Based on the METAS design, it features a precision rotary table, the sample grating mounted in Littrow configuration, a collimated spatially filtered laser source and the retroreflected diffraction order sent by a beamsplitter through a focusing lens to the null-position photodetector. The angle of various diffraction orders can be measured in sequence and used with knowledge of the laser wavelength to calculate the pitch of the grating. Instead of the usual quad-photodetector, the NRC system uses a charge-coupled device (CCD) video camera to capture an image of the diffraction pattern. Image processing accurately measures diffraction order centroid coordinates without a systematic error due to background noise or neighbouring pattern artefacts. The image coordinate system is also used to adjust the instrument and grating alignment and to investigate these sources of systematic error. Preliminary results with 1D sample gratings ranging in pitch from 700 nm to 10 µm are presented.

Uncertainty evaluation of the NRC imaging diffractometer

A model equation is developed for a diffractometer operating under the Littrow condition. The effects of grating orientation, grating position, source and detector position and source collimation are included. The model is validated against experimental measurements using the NRC imaging diffractometer. Errors due to the effects of coherence and grating position were found to be important for the small area gratings used in these experiments. An uncertainty budget for the NRC imaging diffractometer is developed and reproducibility measurements are presented.

Evaluation of uncertainty in grating pitch measurement by optical diffraction using Monte Carlo methods

Measurement of grating pitch by optical diffraction is one of the few methods currently available for establishing traceability to the definition of the meter on the nanoscale; therefore, understanding all aspects of the measurement is imperative for accurate dissemination of the SI meter. A method for evaluating the component of measurement uncertainty associated with coherent scattering in the diffractometer instrument is presented. The model equation for grating pitch calibration by optical diffraction is an example where Monte Carlo (MC) methods can vastly simplify evaluation of measurement uncertainty. This paper includes discussion of the practical aspects of implementing MC methods for evaluation of measurement uncertainty in grating pitch calibration by diffraction. Downloadable open-source software is demonstrated.