Hotspot


Archive | 1997

Composition and slurry useful for metal CMP

Steven Grumbine; Christopher C. Streinz; Brian L. Mueller


Archive | 1997

Chemical mechanical polishing slurry for metal layers and films

Debra Lynn Scherber; Vlasta Brusic Kaufman; Rodney C. Kistler; Brian L. Mueller; Christopher C. Streinz


Archive | 1997

Composition for oxide cmp

Gautam S. Grover; Brian L. Mueller


Archive | 1997

Fluoride additive containing chemical mechanical polishing slurry and method for use of same

Christopher C. Streinz; Brian L. Mueller; Michael A. Lucarelli; Max H. Walters


Archive | 1997

Composition and method for polishing rigid disks

Christopher C. Streinz; Matthew Neville; Steven Grumbine; Brian L. Mueller


Archive | 2001

Integrated chemical-mechanical polishing

Bradley J. Staley; Gregory H. Bogush; Jeffrey P. Chamberlain; Paul M. Feeney; Alicia F. Walters; Steven Grumbine; Brian L. Mueller; David J. Schroeder


Archive | 2001

Catalytic reactive pad for metal cmp

Steven Grumbine; Christopher C. Streinz; Brian L. Mueller


Archive | 1997

Composition and slurry useful for metal chemical mechanical polishing(cmp)

Steven Grumbine; Brian L. Mueller; Christopher C. Streinz; シー.ストレインズ クリストファー; ケー.グランバイン スティーブン; エル.ミューラー ブライアン


Archive | 1997

Slurry for chemical and mechanical polishing used for metal layer and film

Vlasta Brusic Kaufman; Rodney C. Kistler; Brian L. Mueller; Debra Lynn Scherber; Christopher C. Streinz; シー.ストレンツ クリストファー; エル.シェーバー デブラ; エル.ミュラー ブライアン; ブルジク カウフマン ブラスタ; シー.キストラー ロドニー


Archive | 2002

Preequilibrium polishing method and system

Gregory H. Bogush; Jeffrey P. Chamberlain; Paul M. Feeney; Brian L. Mueller; David J. Schroeder; Alicia F. Walters

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