Brian W. Huber
Micron Technology
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Publication
Featured researches published by Brian W. Huber.
international convention on information and communication technology electronics and microelectronics | 2017
Gagan Aggarwal; Daniel Henke; Rajyalakshmi Anantatmukala; Seiichi Takedai; Brian W. Huber
Copper voids are critical defect issues in the metal lines. Massive voids cause functional fails and the smaller ones that do not cause any function fails carry high risk of failing later in life. They are threats to product lifetimes. In this work, we discuss a process for dual damascene copper for metal lines capable of causing surface voids.
advanced semiconductor manufacturing conference | 2017
Gagan Aggarwal; Daniel Henke; Seiichi Takedai; Rajyalakshmi Anantatmukala; Brian W. Huber
Copper voids are critical defect issues in the metal lines. Massive voids cause functional fails and the smaller ones that do not cause any function fails carry high risk of failing later in life. They are threats to product lifetimes. In this work, we discuss a process for dual damascene copper for metal lines capable of causing surface voids.
Archive | 2012
Brian W. Huber; Parthasarathy Gajapathy
Archive | 2004
Craig T. Salling; Brian W. Huber
Archive | 2002
Brian W. Huber
Archive | 2002
Brian W. Huber
Archive | 2000
Craig T. Salling; Brian W. Huber
Archive | 1999
Brian W. Huber; Todd A. Dauenbaugh
Archive | 2001
Brian W. Huber; David R. Brown
Archive | 2000
Brian W. Huber; David R. Brown