Byeong-Ok Lim
Samsung
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Publication
Featured researches published by Byeong-Ok Lim.
IEEE Electron Device Letters | 2004
Bok-Hyung Lee; Dan An; Mun-Kyo Lee; Byeong-Ok Lim; Sun-Hyoung Kim; Jin-Koo Rhee
We report broadband high-gain W-band monolithic microwave integrated circuit amplifiers based on 0.1-/spl mu/m InGaAs-InAlAs-GaAs metamorphic high electron mobility transistor (MHEMT) technology. The amplifiers show excellent S/sub 21/ gains greater than 10 dB in a very broad W-band frequency range of 75-100 GHz, thereby exhibiting a S/sub 21/ gain of 10.1 dB, a S/sub 11/ of -5.1 dB and a S/sub 22/ of -5.2 dB at 100 GHz, respectively. The high gain of the amplifier is mainly attributed to the performance of the MHEMTs exhibiting a maximum transconductance of 691 mS/mm, a current gain cutoff frequency of 189 GHz, and a maximum oscillation frequency of 334 GHz.
Japanese Journal of Applied Physics | 2004
Han-Shin Lee; Dong-Hoon Shin; Sung-Chan Kim; Byeong-Ok Lim; Tae-Jong Baek; Baek-Seok Ko; Young-Hoon Chun; Soon-Koo Kim; Hyun-Chung Park; Jin-Koo Rhee
In this study, we first fabricated a new GaAs-based dielectric-supported air-gap microstrip lines (DAMLs) by the surface microelectromechanical systems (MEMS) technology, and then fabricated the low-pass filter (LPF) for the Ka-band using those DAMLs. We elevated the signal lines from the surface in order to reduce the substrate dielectric loss and to obtain low losses at the millimeter-wave frequency band with a wide impedance range. We fabricated LPFs with DAMLs for Ka-bands, and we were able to reduce the insertion loss of LPFs by reducing the dielectric loss of the DAMLs. Miniaturization is essential for integrating LPFs with active devices, so we fabricated a LPF with the slot on the ground metal to reduce the size of the LPF. We compared the characteristics of the LPF with a slot and the LPF without the slot.
The Journal of Korean Institute of Electromagnetic Engineering and Science | 2013
Sang-Il Kim; Byeong-Ok Lim; Gil-Wong Choi; Bok-Hyung Lee; Hyoung-Joo Kim; Ryun-Hwi Kim; Ki-Sik Im; Jung-Hee Lee; Jung-Soo Lee; Jong-Min Lee
This letter presents the MISHFET with si-doped AlGaN/GaN heterostructure for power amplifier. The device grown on 6H-SiC(0001) substrate with a gate length of 180 nm has been fabricated. The fabricated device exhibited maximum drain current density of 837 mA/mm and peak transconductance of 177 mS/mm. A unity current gain cutoff frequency was 45.6 GHz and maximum frequency of oscillation was 46.5 GHz. The reported output power density was 1.54 W/mm and A PAE(Power Added Efficiency) was 40.24 % at 9.3 GHz.
ITC-CSCC :International Technical Conference on Circuits Systems, Computers and Communications | 2003
Byeong-Ok Lim; Tae-Shin Kang; Bok-Hyung Lee; Mun-Kyo Lee; Jin-Koo Rhee
Journal of Crystal Growth | 2014
Dong-Seok Kim; Chul-Ho Won; Ryun-Hwi Kim; Byeong-Ok Lim; Gil-Wong Choi; Bok-Hyung Lee; Hyoung-Joo Kim; In-Pyo Hong; Jung-Hee Lee
The Journal of The Korea Institute of Intelligent Transport Systems | 2011
Suk-Woo Shin; Hyoung-Jong Kim; Gil-Wong Choi; Jin-Joo Choi; Byeong-Ok Lim; Bok-Hyung Lee
Electronics Letters | 2013
Bok-Hyung Lee; Ryun-Hwi Kim; Byeong-Ok Lim; Gil-Wong Choi; Huijung Kim; In-Pyo Hong; Jyung Hyun Lee
Journal of the Korean Physical Society | 2008
Jae-Seo Lee; Jung-Hun Oh; Byeong-Ok Lim; Jin-Koo Rhee; Sam-Dong Kim
The Journal of Korean Institute of Electromagnetic Engineering and Science | 2017
Song-Hyun Yun; Si-Ok Kim; Su Hyun Lee; Byeong-Ok Lim; Bok-Hyung Lee; Yong-Kyu Jeon; Hyun-Kyu Kim; Young-Geun Yoo
Archive | 2008
Byeong-Ok Lim; Tae-Jong Baek; Seok-Gyu Choi; Young-Hyun Baek; Yeon-Sik Chae