C. Krellner
Goethe University Frankfurt
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Featured researches published by C. Krellner.
Applied Physics Letters | 2004
J. Takeya; T. Nishikawa; Taishi Takenobu; S. Kobayashi; Y. Iwasa; T. Mitani; C. Goldmann; C. Krellner; Bertram Batlogg
The surface conductivity is measured by a four-probe technique for pentacene and rubrene single crystals laminated on polarized and nearly unpolarized molecular monolayers with application of perpendicular electric fields. The polarization of the self-assembled monolayers (SAMs) shifts the threshold gate voltage, while maintaining a very low subthreshold swing of the single-crystal devices (0.11 V∕decade). The results, excluding influences of parasitic contacts and grain boundaries, demonstrate SAM-induced nanoscale charge injection up to ∼1012cm−2 at the surface of the organic single crystals.
Journal of Applied Physics | 2006
C. Goldmann; C. Krellner; Kurt P. Pernstich; Simon Haas; David J. Gundlach; Bertram Batlogg
In order to gain further insight into the details of charge transport in organic semiconductor devices it is necessary to characterize the density of trap states at the semiconductor∕gate dielectric interface. Here we use the technique of gate bias stress to quantitatively determine the interface trap density in rubrene single-crystal field-effect transistors with two different types of interfaces. A reversible and reproducible shift of the I‐V characteristics is observed upon both negative and positive gate bias stress, whose physical origin is identified as charge trapping and detrapping at the crystal∕SiO2 insulator interface. We can thus quantify the density of interface traps that are alternately filled and emptied on a time scale of ≅1h in the energy range defined by the applied bias stress. For a typical rubrene∕SiO2 interface we extract a density of ∼2×1012cm−2 at a stress bias of ±50V, corresponding to a volume density of ≅1019∕(cm3eV). An octadecyltrichlorosilane treatment of the SiO2 dielectric...
Physical Review B | 2008
C. Krellner; N. Caroca-Canales; A. Jesche; H. Rosner; Alim Ormeci; C. Geibel
Resistivity, specific-heat, and magnetic-susceptibility measurements performed on
New Journal of Physics | 2006
P. Gegenwart; Y. Tokiwa; T. Westerkamp; Franziska Weickert; J. Custers; J. Ferstl; C. Krellner; C. Geibel; P. Kerschl; Klaus Muller; F. Steglich
{\text{SrFe}}_{2}{\text{As}}_{2}
Physical Review B | 2007
C. Krellner; Simon Haas; C. Goldmann; Kurt P. Pernstich; David J. Gundlach; Bertram Batlogg
samples evidence a behavior very similar to that observed in LaFeAsO and
Nature | 2011
S. Ernst; Stefan Kirchner; C. Krellner; C. Geibel; Gertrud Zwicknagl; F. Steglich; S. Wirth
{\text{BaFe}}_{2}{\text{As}}_{2}
Physical Review B | 2008
A. Jesche; N. Caroca-Canales; H. Rosner; Horst Borrmann; Alim Ormeci; Deepa Kasinathan; H.-H. Klauss; H. Luetkens; Rustem Khasanov; A. Amato; A. Hoser; K. Kaneko; C. Krellner; C. Geibel
, with the difference being that the formation of the spin-density wave and the lattice deformation occur in a pronounced first-order transition at
Proceedings of the National Academy of Sciences of the United States of America | 2010
Sven Friedemann; N. Oeschler; Steffen Wirth; C. Krellner; Christoph Geibel; F. Steglich; S. Paschen; Stefan Kirchner; Qimiao Si
{T}_{0}=205\text{ }\text{K}
Physical Review Letters | 2008
E. M. Brüning; C. Krellner; M. Baenitz; A. Jesche; F. Steglich; C. Geibel
. Comparing further data evidences that the Fe magnetism is stronger in
Physical Review B | 2007
C. Krellner; N. S. Kini; E. M. Brüning; K. Koch; H. Rosner; M. Nicklas; M. Baenitz; C. Geibel
{\text{SrFe}}_{2}{\text{As}}_{2}